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Persistence of Charge Ordering Instability to Coulomb Engineering in the Excitonic Insulator Candidate TiSe2

Sebastian Buchberger1,2, Yann in ’t Veld3, Akhil Rajan1, Philip A. E. Murgatroyd1, Brendan Edwards1, Bruno K. Saika1, Naina Kushwaha1,4, Maria H. Visscher1,2, Jan Berges5 et al.

Dina Carbone6, Jacek Osiecki6, Craig Polley6, Tim Wehling3,7,*, and Phil D. C. King1,†

  • *Contact author: tim.wehling@physik.uni-hamburg.de
  • †Contact author: pdk6@st-andrews.ac.uk

Phys. Rev. X 15, 041028 – Published 12 November, 2025

DOI: https://doi.org/10.1103/9trc-9865

Abstract

TiSe2 has long been considered one of the best candidate materials to host the elusive excitonic insulator (EI) phase. However, a finite coupling to the lattice can generically be expected, while a lack of “smoking-gun” signatures for the importance of the electron-hole interaction in driving the phase transition has rendered it challenging to distinguish the EI from the conventional charge-density wave (CDW) phase. Here, we demonstrate a new approach, exploiting the susceptibility of excitons to dielectric screening. We combine mechanical exfoliation with molecular-beam epitaxy to fabricate ultraclean van der Waals heterostructures of monolayer (ML) TiSe2/graphite and ML TiSe2/h-BN. We observe how the modified substrate screening environment drives a renormalization of the quasiparticle band gap of the TiSe2 layer, signifying its susceptibility to Coulomb engineering. The temperature-dependent evolution of its electronic structure, however, remains unaffected, indicating that excitons are not required to drive the CDW transition in TiSe2.

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