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  • Letter

Universal fast mode regime in wetting kinetics

Syed Shuja Hasan Zaidi1, Prabhat K. Jaiswal1,*, Madhu Priya2, and Sanjay Puri3,†

  • 1Department of Physics, Indian Institute of Technology Jodhpur, Karwar 342030, India
  • 2Department of Physics, Birla Institute of Technology Mesra, Ranchi 835215, India
  • 3School of Physical Sciences, Jawaharlal Nehru University, New Delhi 110067, India

  • *Corresponding author: prabhat.jaiswal@iitj.ac.in
  • †Corresponding author: puri@mail.jnu.ac.in

Phys. Rev. E 106, L052801 – Published 1 November, 2022

DOI: https://doi.org/10.1103/PhysRevE.106.L052801

Abstract

We present simulation results from a comprehensive molecular dynamics (MD) study of surface-directed spinodal decomposition (SDSD) in unstable symmetric binary mixtures at wetting surfaces. We consider long-ranged and short-ranged surface fields to investigate the early stage wetting kinetics. The attractive part of the long-ranged potential is of the form V(z)∼z−n, where z is the distance from the surface and n is the power-law exponent. We find that the wetting-layer thickness R1(t) at very early times exhibits a power-law growth with an exponent α=1/(n+2). It then crosses over to a universal fast-mode regime with α=3/2. In contrast, for the short-ranged surface potential, a logarithmic behavior in R1(t) is observed at initial times. Remarkably, similar rapid growth is seen in this case too. We provide phenomenological arguments to understand these growth laws. Our MD results firmly establish the existence of universal fast-mode kinetics and settle the related controversy.

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