Surface and bulk modulation in photoreflectance from undoped GaAs
Michael Sydor, James R. Engholm, Daniel A. Dale, and T. J. Fergestad
Phys. Rev. B 49, 7306 (1994) - Published 15 March, 1994
Plasma discharge is used to alter the surface potential in undoped GaAs. The results determine the origin and the magnitude of photomodulation in photoreflectance from undoped GaAs. We examine photoreflectance for 30–70-kV/cm surface electric fields in undoped GaAs grown on heavily doped n- or p-type GaAs underlayers, and samples, respectively. Photoreflectance for 2–500-μW/ laser modulation intensity was analyzed using separate electro-optic functions to determine the magnitude of the built-in electric field in the dark and the laser illuminated samples. Before plasma discharge, photomodulation of the built-in electric field in samples was about three times that in samples at 0.2 mW/. The large modulation in samples appears to have come from surface modulation effects, possibly from poor pinning of the surface Fermi energy. A hydrogen plasma discharge lasting 4 s produced long term effects in samples. It increased the magnitude of the electric field in samples from ∼40 kV/cm to ∼60 kV/cm, at 0.2 mW/. The discharge more than doubled the amplitude of photoreflectance signal and increased the number of Franz-Keldysh oscillations. After discharge, the photomodulation voltage for samples was reduced from 0.32 to 0.14 V at 0.2 mW/, and became comparable with bulk photovoltage from (p-i-n) structures and structures.