Stress tuning of the magnetic properties of a near-metallic sample of silicon doped with phosphorus
P. J. Mason and D. P. Tunstall
Phys. Rev. B 50, 14809 (1994) - Published 15 November, 1994
We report measurements down to 16 mK of the electron-spin resonance (ESR) of a sample of silicon doped with phosphorus, of doping density n/ (at ambient stress) of 0.85. Stress tuning to 0.28 GPa along the 〈100〉 direction is used to ‘‘tune’’ the critical doping density at the metal-nonmetal transition and thus vary n/ up to the value 0.91. The electron-spin susceptibility and ESR linewidth vary with temperature below 4.2 K in the same way, and the change in this variation with stress over most of the temperature range shows a strong magnetic-field and frequency dependence at the low fields of our experiments (∼10–20 G). This implies that, as the metal-nonmetal transition approaches, the effect of magnetic field in polarizing the electron-spin pairs becomes rapidly weaker. However, at the lowest temperatures, with or without stress, a cusp develops in the susceptibility versus temperature behavior; we speculate that, so close to the metal-nonmetal transition, the exchange interactions are becoming sufficiently long range for spin-glass behavior to develop. Alternatively, the ‘‘rare-spins’’ scenario, coupled by Ruderman-Kittel-Kasuya-Yosida interactions, of Bhatt and Fisher may be driving the spin-glass behavior. At the low end of the temperature range only about 7% of the electron spins remain magnetically active. The rate of variation of the susceptibility with stress (which tunes ) at the lowest temperatures is rather fast, with χ varying as .