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Physical Review B

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J Appl Crystallogr (1)

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High-speed x-ray reflectometry for characterization of thin film growth at high deposition rates

David Schumi-Mareček ¹, Andrew Nelson ², Erwin Pfeiler ¹, Maximilian Eder ¹, Florian Bertram ³, and Stefan Kowarik ^1,*

¹Physikalische und Theoretische Chemie, Universität Graz, Heinrichstraße 28, Graz, 8010, Austria
²ANSTO, Locked Bag 2001, Kirrawee DC, NSW 2232, Australia
³Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany

^*Contact author: stefan.kowarik@uni-graz.at

Microsecond X-ray reflectometry

Michael Haberl, Maximilian Eder, Erwin Pfeiler, David Schumi-Mareček, Florian Bertram, Petr Mikulík, and Stefan Kowarik

J Appl Crystallogr 59 1112 (2026)

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ISSN 2469-9969 (online), 2469-9950 (print).

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