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M center in 4H-SiC is a carbon self-interstitial

J. Coutinho1,*, J. D. Gouveia1,†, T. Makino2, T. Ohshima2, Ž. Pastuović3, L. Bakrač4, T. Brodar4, and I. Capan4

  • 1I3N, Department of Physics, University of Aveiro, Campus Santiago, 3810-193 Aveiro, Portugal
  • 2Takasaki Advanced Radiation Research Institute, National Institutes for Quantum and Radiological Science and Technology, 1233 Watanuki, Takasaki, Gunma 370-1292, Japan
  • 3Centre for Accelerator Science, Australian Nuclear Science and Technology Organisation, 1 New Illawarra Rd, Lucas Heights, NSW 2234, Australia
  • 4Ruđer Bošković Institute, Bijenicḱa 54, 10000 Zagreb, Croatia

  • *jose.coutinho@ua.pt
  • †Present address: CICECO, Department of Chemistry, University of Aveiro, Campus Santiago, 3810-193 Aveiro, Portugal.

Phys. Rev. B 103, L180102 – Published 28 May, 2021

DOI: https://doi.org/10.1103/PhysRevB.103.L180102

Abstract

The list of semiconductor materials with spectroscopically fingerprinted self-interstitials is very short. The M center in 4H-SiC, a bistable defect responsible for a family of electron traps, has been deprived of a model which could unveil its real importance for almost two decades. Using advanced first-principles calculations and junction spectroscopy, we demonstrate that the properties of M, including bistability, annealing, reconfiguration kinetics, and electronic levels match those of the carbon self-interstitial.

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