Dominant recombination paths in and -related structures are investigated using cathodoluminescence (CL) mapping measurements and photoluminescence (PL) spectroscopy. The dark spot contrasts originating from nonradiative recombination at threading dislocations (TDs), which are observed in CL intensity maps, drastically decrease upon elevating the temperature. This is because carriers can reach TDs at low temperatures (9–60 K), but are captured by point defects (PDs) even in the vicinity of TDs near RT. Calculations based on the experimental results indicate that in the current and -rich crystals, TDs scarcely affect the internal quantum efficiency (IQE) at RT as long as the TD density is less than . Because a TD density less than has already been achieved even for heteroepitaxially grown films on sapphire substrates, it is evident that the most effective method to further improve the IQE of -related materials is to reduce PDs not TDs. Moreover, we clarify the existence of two types of PD states, which mainly degrade the emission efficiency, using temperature-dependent PL measurements. Combining the CL and PL results allows the activation energies of these PDs and TDs to be evaluated. Furthermore, we highlight the probability that PDs, which predominantly act as nonradiative recombination centers at room temperature, are complexes formed by vacancies and oxygen impurities that enhance the deep-level emissions at 3.2 and 3.5–3.7 eV near room temperature. Such a large impact of PDs on the efficiency degradation may be attributed to the high density of -vacancy–related PDs in and -rich compared with that of -vacancy–related PDs in due to the small formation energy.