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Laser-Induced Spectral Diffusion of T Centers in Silicon Nanophotonic Devices

Xueyue Zhang1,2,*, Niccolò Fiaschi1,2,3, Lukasz Komza2,4, Hanbin Song4,5, Thomas Schenkel3, and Alp Sipahigil1,2,4,†

  • *Present address: Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027, USA.
  • †Contact author: alp@berkeley.edu

PRX Quantum 6, 030351 – Published 16 September, 2025

DOI: https://doi.org/10.1103/x2cv-2gcw

Abstract

Color centers in silicon are emerging as spin-photon interfaces operating at telecommunication wavelengths. The nanophotonic device integration of silicon color centers via ion implantation leads to significant optical-linewidth broadening, which makes indistinguishable photon generation challenging. Here, we study the optical spectral diffusion of T centers in a silicon photonic crystal cavity. We investigate the linewidth-broadening timescales and origins by measuring the temporal correlations of the resonance frequency under different conditions. Spectral hole-burning measurements reveal no spectral broadening at short timescales from 102 ns to 725 ns. We probe broadening at longer timescales using a check pulse to herald the T-center frequency and a probe pulse to measure the frequency after a wait time. The optical resonance frequency is stable up to 3 ms in the dark. Laser pulses below the silicon band gap applied during the wait time lead to linewidth broadening. Our observations establish laser-induced processes as the dominant spectral-diffusion mechanism for T centers in devices and inform materials and feedback strategies for indistinguishable photon generation.

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Laser-Induced Spectral Diffusion and Excited-State Mixing of Silicon T Centers

Camille Bowness, Simon A. Meynell, Michael Dobinson, Chloe Clear, Kais Jooya, Nicholas Brunelle, Mehdi Keshavarz, Katarina Boos, Melanie Gascoine, Shahrzad Taherizadegan, Christoph Simon, Mike L.W. Thewalt, Stephanie Simmons, and Daniel B. Higginbottom
PRX Quantum 6, 030350 (2025)

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