- Letter
- Open Access
Quantum spin Hall phase in GeSn heterostructures on silicon
Phys. Rev. Research 5, L022035 – Published 22 May, 2023
DOI: https://doi.org/10.1103/PhysRevResearch.5.L022035
Abstract
Quantum phases of solid-state electron systems can sustain exotic phenomena and a very rich spin physics. We utilize model-solid theory to show that alloys, an emerging group IV semiconductor, can be engineered into heterostructures that demonstrate a broken-gap alignment. Furthermore, the eight-band method is used to disclose a quantum spin Hall phase in heterojunctions that accommodates the existence of gate-controlled chiral edge states. This proposal introduces a practical silicon-based architecture that spontaneously sustains topological properties, while being compatible with the high-volume manufacture of semiconductor technologies.
Physics Subject Headings (PhySH)
Article Text
Supplemental Material
References (34)
- B. A. Bernevig, T. L. Hughes, and S.-C. Zhang, Quantum spin Hall effect and topological phase transition in HgTe quantum wells, Science 314, 1757 (2006).
- M. König, S. Wiedmann, C. Brüne, A. Roth, H. Buhmann, L. W. Molenkamp, X.-L. Qi, and S.-C. Zhang, Quantum spin hall insulator state in HgTe quantum wells, Science 318, 766 (2007).
- C. Liu, T. L. Hughes, X.-L. Qi, K. Wang, and S.-C. Zhang, Quantum Spin Hall Effect in Inverted Type-II Semiconductors, Phys. Rev. Lett. 100, 236601 (2008).
- M. Z. Hasan and C. L. Kane, Colloquium: Topological insulators, Rev. Mod. Phys. 82, 3045 (2010).
- I. Knez, R.-R. Du, and G. Sullivan, Evidence for Helical Edge Modes in Inverted InAs/GaSb Quantum Wells, Phys. Rev. Lett. 107, 136603 (2011).
- L. Du, I. Knez, G. Sullivan, and R.-R. Du, Robust Helical Edge Transport in Gated InAs/GaSb Bilayers, Phys. Rev. Lett. 114, 096802 (2015).
- M. S. Miao, Q. Yan, C. G. Van de Walle, W. K. Lou, L. L. Li, and K. Chang, Polarization-Driven Topological Insulator Transition in a GaN/InN/GaN Quantum Well, Phys. Rev. Lett. 109, 186803 (2012).
- D. Zhang, W. Lou, M. Miao, S.-c. Zhang, and K. Chang, Interface-Induced Topological Insulator Transition in GaAs/Ge/GaAs Quantum Wells, Phys. Rev. Lett. 111, 156402 (2013).
- Y. Xu, B. Yan, H.-J. Zhang, J. Wang, G. Xu, P. Tang, W. Duan, and S.-C. Zhang, Large-Gap Quantum Spin Hall Insulators in Tin Films, Phys. Rev. Lett. 111, 136804 (2013).
- M. S. Lodge, S. A. Yang, S. Mukherjee, and B. Weber, Atomically thin quantum spin Hall insulators, Adv. Mater. 33, 2008029 (2021).
- C. G. Van de Walle, Band lineups and deformation potentials in the model-solid theory, Phys. Rev. B 39, 1871 (1989).
- R. A. Soref and L. Friedman, Direct-gap Ge/GeSn/Si and GeSn/Ge/Si heterostructures, Superlattices Microstruct. 14, 189 (1993).
- G.-E. Chang, S.-W. Chang, and S. L. Chuang, Strain-balanced multiple-quantum-well lasers, IEEE J. Quantum Elect. 46, 1813 (2010).
- H. S. Maczko, R. Kudrawiec, and M. Gladysiewicz, Material gain engineering in GeSn/Ge quantum wells integrated with an Si platform, Sci. Rep. 6, 34082 (2016).
- S. Wirths, D. Buca, and S. Mantl, Si–Ge–Sn alloys: From growth to applications, Prog. Cryst. Growth Ch. 62, 1 (2016).
- C. Xu, D. Ringwala, D. Wang, L. Liu, C. D. Poweleit, S. L. Y. Chang, H. L. Zhuang, J. Menéndez, and J. Kouvetakis, Synthesis and fundamental studies of Si-compatible (Si)GeSn and GeSn mid-IR systems with ultrahigh Sn contents, Chem. Mater. 31, 9831 (2019).
- J. Zheng, Z. Liu, Y. Zhang, Y. Zuo, C. Li, C. Xue, B. Cheng, and Q. Wang, Growth of high-Sn content (28%) GeSn alloy films by sputtering epitaxy, J. Cryst. Growth 492, 29 (2018).
- W. Dou, Y. Zhou, J. Margetis, S. A. Ghetmiri, S. Al-Kabi, W. Du, J. Liu, G. Sun, R. A. Soref, J. Tolle, B. Li, M. Mortazavi, and S.-Q. Yu, Optically pumped lasing at 3 from compositionally graded GeSn with tin up to 22.3%, Opt. Lett. 43, 4558 (2018).
- W. Dou, M. Benamara, A. Mosleh, J. Margetis, P. Grant, Y. Zhou, S. Al-Kabi, W. Du, J. Tolle, B. Li, M. Mortazavi, and S.-Q. Yu, Investigation of GeSn strain relaxation and spontaneous composition gradient for low-defect and high-Sn alloy growth, Sci. Rep. 8, 5640 (2018).
- X. Liu, J. Zheng, M. Li, F. Wan, C. Niu, Z. Liu, Y. Zuo, C. Xue, and B. Cheng, Growth of relaxed GeSn film with high Sn content via Sn component-grade buffer layer structure, J. Phys. D: Appl. Phys. 54, 435101 (2021).
- S. Assali, J. Nicolas, and O. Moutanabbir, Enhanced Sn incorporation in GeSn epitaxial semiconductors via strain relaxation, J. Appl. Phys. 125, 025304 (2019).
- J.-Z. Chen, H. Li, H. H. Cheng, and G.-E. Chang, Structural and optical characteristics of /Ge superlattices grown on Ge-buffered Si(001) wafers, Opt. Mater. Express 4, 1178 (2014).
- I. A. Fischer, C. J. Clausen, D. Schwarz, P. Zaumseil, G. Capellini, M. Virgilio, M. C. da Silva Figueira, S. Birner, S. Koelling, P. M. Koenraad, M. R. S. Huang, C. T. Koch, T. Wendav, K. Busch, and J. Schulze, Composition analysis and transition energies of ultrathin Sn-rich GeSn quantum wells, Phys. Rev. Mater. 4, 024601 (2020).
- M. Montanari, M. Virgilio, C. L. Manganelli, P. Zaumseil, M. H. Zoellner, Y. Hou, M. A. Schubert, L. Persichetti, L. Di Gaspare, M. De Seta, E. Vitiello, E. Bonera, F. Pezzoli, and G. Capellini, Photoluminescence study of interband transitions in few-layer, pseudomorphic, and strain-unbalanced Ge/GeSi multiple quantum wells, Phys. Rev. B 98, 195310 (2018).
- See Supplemental Material at http://link.aps.org/supplemental/10.1103/PhysRevResearch.5.L022035 for more details on the numerical simulations, the dependence of the band-edge alignments on strain and Sn content, and the energy spectrum of finite-sized unbiased superlattices.
- E. J. O'Halloran, C. A. Broderick, D. S. P. Tanner, S. Schulz, and E. P. O'Reilly, Comparison of first principles and semi-empirical models of the structural and electronic properties of alloys, Opt. Quantum Electron. 51, 314 (2019).
- T. D. Eales, I. P. Marko, S. Schulz, E. O'Halloran, S. Ghetmiri, W. Du, Y. Zhou, S.-Q. Yu, J. Margetis, J. Tolle, E. P. O'Reilly, and S. J. Sweeney, alloys: Consequences of band mixing effects for the evolution of the band gap -character with Sn concentration, Sci. Rep. 9, 14077 (2019).
- S. Birner, T. Zibold, T. Andlauer, T. Kubis, M. Sabathil, A. Trellakis, and P. Vogl, nextnano: General purpose 3-D simulations, IEEE Trans. Electron Devices 54, 2137 (2007).
- A. Khaetskii, V. Golovach, and A. Kiefer, Revisiting the physical origin and nature of surface states in inverted-band semiconductors, Phys. Rev. B 105, 035305 (2022).
- I. Belopolski, S.-Y. Xu, N. Koirala, C. Liu, G. Bian, V. N. Strocov, G. Chang, M. Neupane, N. Alidoust, D. Sanchez, H. Zheng, M. Brahlek, V. Rogalev, T. Kim, N. C. Plumb, C. Chen, F. Bertran, P. L. Fèvre, A. Taleb-Ibrahimi, M.-C. Asensio et al., A novel artificial condensed matter lattice and a new platform for one-dimensional topological phases, Sci. Adv. 3, e1501692 (2017).
- A. Giorgioni, S. Paleari, S. Cecchi, E. Vitiello, E. Grilli, G. Isella, W. Jantsch, M. Fanciulli, and F. Pezzoli, Strong confinement-induced engineering of the factor and lifetime of conduction electron spins in Ge quantum wells, Nat. Commun. 7, 13886 (2016).
- S. De Cesari, A. Balocchi, E. Vitiello, P. Jahandar, E. Grilli, T. Amand, X. Marie, M. Myronov, and F. Pezzoli, Spin-coherent dynamics and carrier lifetime in strained /Ge semiconductors on silicon, Phys. Rev. B 99, 035202 (2019).
- C.-T. Tai, P.-Y. Chiu, C.-Y. Liu, H.-S. Kao, C. T. Harris, T.-M. Lu, C.-T. Hsieh, S.-W. Chang, and J.-Y. Li, Strain effects on Rashba spin-orbit coupling of 2D hole gases in GeSn/Ge heterostructures, Adv. Mater. 33, 2007862 (2021).
- S. Assali, A. Attiaoui, P. D. Vecchio, S. Mukherjee, J. Nicolas, and O. Moutanabbir, A light-hole germanium quantum well on silicon, Adv. Mater. 34, 2201192 (2022).