Articles Citing

Atomic resolution imaging of the strength and 3D direction of atomic displacements in functional oxide thin films

Ian Maclaren1,*, Aurys Silinga1, Juri Barthel2, Josee Kleibeuker3,4, Judith L MacManus-Driscoll3, Christopher S. Allen5,6, and Angus I. Kirkland5,6

  • 1School of Physics and Astronomy, University of Glasgow, Glasgow G12 8QQ, United Kingdom
  • 2Ernst Ruska-Centre (ER-C 2), Forschungszentrum Jülich GmbH, 52425 Jülich, Germany
  • 3Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 OFS, United Kingdom
  • 4DEMCON high tech systems Eindhoven BV, Kanaaldijk 29, 5683 CR Best, The Netherlands
  • 5electron Physical Science Imaging Centre, Diamond Light Source Ltd., Didcot OX11 0DE, United Kingdom
  • 6Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom

  • *Contact author: ian.maclaren@glasgow.ac.uk

Ian Maclaren, Aurys Silinga, Juri Barthel, Josee Kleibeuker, Judith L MacManus-Driscoll, Christopher S. Allen, and Angus I. Kirkland

Phys. Rev. Materials 9 094404 (2025)

Nidhi Choudhary, Silke A. Peeters, Ciaran T. Lennon, Dmytro Besprozvannyy, Harm C. M. Knoops, Ian Maclaren, and Robert H. Hadfield

APL Materials 13 111104 (2025)

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