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    Interplay of surface transfer doping and Burstein Moss shift in V2O5/V2O5−x: Implications for band gap, doping, and catalysis

    Sangyeon Lee*, Qi Wang*, and Vidhya Chakrapani†

    • *These authors contributed equally to this work.
    • †Contact author: chakrv@rpi.edu

    Phys. Rev. Materials 9, 085801 – Published 12 August, 2025

    DOI: https://doi.org/10.1103/rzvg-r25y

    Abstract

    The observation of the interaction between two coupled effects of surface transfer doping (STD) and Burstein-Moss (B-M) shift on the electrical, optical, and electronic properties of V2O5, a layered van der Waals oxide semiconductor, is reported. Studies on bulk crystals, thin films, and powder samples show that, as a result of its high electron affinity, stoichiometric V2O5 exposed to humid air exhibits the phenomenon of surface transfer doping, in which a surface-absorbed water layer injects electrons into the conduction band (CB) of V2O5, leading to degenerate n-type doping, formation of a surface electron accumulation layer, and a corresponding B-M shift of the surface Fermi level of 0.25–0.6 eV well into the CB edge. In nonstoichiometric oxide (V2O5−x), the presence of high density of bulk oxygen vacancy (VO) defects leads to electron doping, an increased B-M-induced EF shift of 0.4–1.0 eV to higher energy in the bulk. In contrast, the surface EF level remains pinned at lower energy owing to the switch in the STD effect, leading to reverse electron transfer from the oxide to the absorbed water layer, and causing the formation of an electron depletion layer on the surface. The implications of these effects for the wide variations in the reported band gap, doping, and catalysis of V2O5 are discussed.

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