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    Space-induced floating electronic states in non-stoichiometric amorphous silicon nitride for memory devices applications

    Mauro Boero1,2,*, Kenji Shiraishi2,3,4, Tomoya Nagahashi3,5, Fugo Nanataki3, and Atsushi Oshiyama2,4,†

    • 1University of Strasbourg-CNRS, ICube Laboratory UMR 7357, F-67412 Illkirch, France
    • 2Institute of Materials and Systems for Sustainability, Nagoya University, Furo, Chikusa, Nagoya 464–8601, Japan
    • 3Graduate School of Engineering, Nagoya University, Furo, Chikusa, Nagoya 464–8603, Japan
    • 4Center for Innovative Integrated Electronic Systems, Tohoku University, Aramaki-aza-Aoba, Aoba-ku Sendai 980–8572, Japan
    • 5Kokusai Electric Corporation, Toyama-City, Toyama 939–2393, Japan

    • *Contact author: boero@unistra.fr
    • †Contact author: atsushi.oshiyama.b5@tohoku.ac.jp

    Phys. Rev. Materials 9, 084601 – Published 1 August, 2025

    DOI: https://doi.org/10.1103/mc16-76ck

    Abstract

    By resorting to first-principles simulations, we unveil the existence of peculiar electronic states in non-stoichiometric amorphous SiN that seem to float in the internal cavities present in the system. These states, if unoccupied, are located in the conduction band along with regular antibonding states. Upon occupation by electrons, they are energetically displaced in the gap of the system or in the upper part of the valence band depending on the stoichiometry and morphology of the cavities, without significant change in their floating nature. These localized floating states are not bound to any specific atom and can be easily charged/uncharged providing insight into the mechanism responsible for the basic function of flash memory devices and guidelines for their design.

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