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Efficient creation of shallow ensembles by high-angle ion implantation
Phys. Rev. Materials 10, 086202 – Published 11 August, 2026
DOI: https://doi.org/10.1103/d8vg-ntsg
Abstract
Negatively charged nitrogen-vacancy centers located a few nanometers below the diamond surface are key quantum defects for nanoscale sensing of external spins. However, the creation of shallow centers with high yield remains a materials challenge. Here, we demonstrate that high-angle ion implantation enhances the creation efficiency of shallow centers. By implanting ions at angles exceeding , we achieve high yields approaching 10% with effective depths below 10 nm. These yields are significantly higher than those typically reported for shallow creation. The enhanced yield is consistent with an increased vacancy-to-nitrogen ratio in the near-surface region, which is expected to promote NV formation during annealing. The created ensembles show coherence properties comparable to those of single shallow centers at similar depths, and allow detection of nuclear spins in van der Waals materials attached to the diamond surface. Our results establish geometric control of ion implantation as a simple and broadly applicable approach to engineer shallow vacancy-related quantum defects.