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Efficient creation of shallow NV− ensembles by high-angle ion implantation

Kento Sasaki1,*, Hideyuki Watanabe2, Tokuyuki Teraji3, Takashi Taniguchi4, Kenji Watanabe3, and Kensuke Kobayashi1,5,6,†

  • *Contact author: kento.sasaki@phys.s.u-tokyo.ac.jp
  • †Contact author: kensuke@phys.s.u-tokyo.ac.jp

Phys. Rev. Materials 10, 086202 – Published 11 August, 2026

DOI: https://doi.org/10.1103/d8vg-ntsg

Abstract

Negatively charged nitrogen-vacancy (NV−) centers located a few nanometers below the diamond surface are key quantum defects for nanoscale sensing of external spins. However, the creation of shallow NV− centers with high yield remains a materials challenge. Here, we demonstrate that high-angle ion implantation enhances the creation efficiency of shallow NV− centers. By implanting N15 ions at angles exceeding 60∘, we achieve high NV− yields approaching 10% with effective NV− depths below 10 nm. These yields are significantly higher than those typically reported for shallow NV− creation. The enhanced NV− yield is consistent with an increased vacancy-to-nitrogen ratio in the near-surface region, which is expected to promote NV formation during annealing. The created NV− ensembles show coherence properties comparable to those of single shallow NV− centers at similar depths, and allow detection of nuclear spins in van der Waals materials attached to the diamond surface. Our results establish geometric control of ion implantation as a simple and broadly applicable approach to engineer shallow vacancy-related quantum defects.

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