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Electron and hole doping of monolayer WSe2 induced by twisted ferroelectric hexagonal boron nitride

J. Fraunié1, R. Jamil1, R. Kantelberg1, S. Roux1, L. Petit1, E. Lepleux2, L. Pacheco2, K. Watanabe3, T. Taniguchi4 et al.

V. Jacques5, L. Lombez1, M. M. Glazov6, B. Lassagne1, X. Marie1, and C. Robert1,*

  • 1Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 Avenue Rangueil, 31077 Toulouse, France
  • 2CSI Instruments, 17 Avenue des Andes, 91940 Les Ulis, France
  • 3International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-00044, Japan
  • 4Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-00044, Japan
  • 5Laboratoire Charles Coulomb, Université de Montpellier and CNRS, 34095 Montpellier, France
  • 6Ioffe Institute, 26 Polytechnicheskaya, 194021 Saint Petersburg, Russia

  • *cerobert@insa-toulouse.fr

Phys. Rev. Materials 7, L121002 – Published 27 December, 2023

DOI: https://doi.org/10.1103/PhysRevMaterials.7.L121002

Abstract

For the past few years, two-dimensional (2D) ferroelectric materials have attracted strong interest for their potential in future nanoelectronics devices. The recent discovery of 2D ferroelectricity in twisted layers of insulating hexagonal boron nitride, one of the most used 2D materials, has opened the route to its integration into complex van der Waals heterostructures combining hybrid properties. Here we show that opposite polarizations in ferroelectric domains of a folded hBN layer can imprint local n and p doping in a semiconducting transition metal dichalcogenide WSe2 monolayer. We demonstrate that WSe2 can be used as an optical probe of ferroelectricity in hBN and show that the doping density and type can be controlled with the position of the semiconductor with respect to the ferroelectric interface. Our results establish the ferroelectric hBN/WSe2 van der Waals stacking as a promising optoelectronic structure.

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