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  • Letter
  • Open Access

Continuous network structure of two-dimensional silica across a supporting metal step edge: An atomic scale study

Leonard Gura1, Sergio Tosoni2, Adrián Leandro Lewandowski1, Patrik Marschalik1, Zechao Yang1, Wolf-Dieter Schneider1, Markus Heyde1,*, Gianfranco Pacchioni2, and Hans-Joachim Freund1

  • 1Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany
  • 2Dipartimento di Scienza dei Materiali, Università di Milano-Bicocca, Via R. Cozzi, 55, Milan, Italy

  • *heyde@fhi-berlin.mpg.de
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Phys. Rev. Materials 5, L071001 – Published 29 July, 2021

DOI: https://doi.org/10.1103/PhysRevMaterials.5.L071001

Abstract

The network structure of a silica bilayer film at a monolayer-bilayer transition and across a supporting metal step edge was studied at the atomic scale by scanning tunneling microscopy. The ring size distribution, ring-ring distances, and height profiles are analyzed across the step edge region. Density functional theory proposes two models to explain the observed network structure: a pinning of the lower layer to the substrate and a carpetlike mode. The results indicate a continuous coverage of the silica bilayer film across the step edge.

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Outline

Information

Phys. Rev. Materials 5, L071001– Published 29 July, 2021
  • Received 12 November 2020
  • Revised 2 March 2021
  • Accepted 29 June 2021
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Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI. Open access publication funded by the Max Planck Society.

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