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    Charge transition levels of Ti dopants in oxides: A dielectric-dependent hybrid DFT study

    Qianshan Quan1,2, Longbing Shang3,1,*, and Chang-Kui Duan1,2

    • *Contact author: lbShang@jxnu.edu.cn

    Phys. Rev. Materials 9, 125201 – Published 1 December, 2025

    DOI: https://doi.org/10.1103/8kbc-jd62

    Abstract

    Ti4+/Ti3+ dopants in oxides are known to significantly influence optical and electronic properties, yet a systematic understanding of their defect levels across different hosts remains limited. In this study, we employ dielectric-dependent hybrid density functional theory (PBE0-α) to compute the band gaps and Ti4+/Ti3+ charge transition levels (CTLs) in a range of host materials. The calculated CTLs relative to the valence band maxima show good agreement with experimental data, typically deviating by less than 10%, which is considered acceptable given the uncertainties in experimental measurements. By combining these computational results with experimentally derived vacuum-referenced valence band maxima, we construct band diagrams that clarify the energetic positions of Ti-related defects. These results demonstrate the accuracy and predictive power of the PBE0-α approach and provide a robust computational framework and valuable reference data for the analysis and design of Ti-doped functional oxides.

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