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    Thermodynamic and kinetic stability of Cl and F donors in ZnO

    Supparat Charoenphon1, Audomsak Sripothongnack1, Sukit Limpijumnong2, and Pakpoom Reunchan1,*

    • *Contact author: pakpoom.r@ku.ac.th

    Phys. Rev. Materials 10, 084602 – Published 27 August, 2026

    DOI: https://doi.org/10.1103/7ts3-ktb3

    Abstract

    Zinc oxide (ZnO) is a prototypical wide-band-gap semiconductor whose n-type conductivity can be tailored through extrinsic donor doping. However, the roles of defect association, compensation, and dopant mobility remain incompletely understood. We investigate Cl- and F-related defects in ZnO using screened hybrid density-functional calculations, with emphasis on substitutional donors, defect complexes, vacancy-mediated migration, and self-consistent carrier statistics. Substitutional chlorine and fluorine on the oxygen site, ClO and FO, are predicted to be shallow donors, with (+/0) transition levels above the conduction-band minimum and low formation energies under O-poor conditions. Halogen-native-defect complexes can be thermodynamically bound and provide possible compensation or passivation channels, but their impact on the carrier concentration depends on their equilibrium abundance and charge-state distribution. Self-consistent charge-neutrality calculations show that both Cl and F substitutional donors can sustain n-type conditions under the freeze-in treatment considered here, with the charge balance dominated by ionized substitutional donors and free electrons. Large vacancy-mediated migration barriers further indicate that substitutional halogen donors are kinetically stable after incorporation. These results provide a microscopic description of the thermodynamic, electronic, and kinetic factors governing Cl and F doping in ZnO.

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