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    Physical origin of depolarization effects in HfO2 films

    Shuning Lv1, Qi Hu1,*, Yufeng Xue1, Chuang Xue1, Zihe Wang1, Gilberto Teobaldi2, Tengfei Cao3,†, and Li-Min Liu1,‡

    • *Contact author: huqi@buaa.edu.cn
    • †Contact author: Tengfei.Cao@nwpu.edu.cn
    • ‡Contact author: liminliu@buaa.edu.cn

    Phys. Rev. Materials 9, 084407 – Published 14 August, 2025

    DOI: https://doi.org/10.1103/7sxy-lgz8

    Abstract

    HfO2-based ferroelectric films have demonstrated great potential in nonvolatile memory, sensors, and energy harvesting applications. Although the ferroelectricity of HfO2 thin films can persist at the nanoscale, depolarization effects often lead to polarization degradation or even complete suppression. The underlying physical mechanisms governing this phenomenon remain controversial. Here, the depolarization mechanism of HfO2 films was thoroughly explored based on first-principles calculations, and results reveal that surface phase transitions play a vital role in the depolarization process. Although ferroelectric bulk phases for both Pca21 and Pmn21 are stable, out-of-plane ferroelectric (010) Pca21 film is thermodynamically unstable and transforms into P21/c spontaneously via an effectively barrierless twisting pathway. Notably, only out-of-plane electric polarization is reduced, while the in-plane one remains. Moreover, the tensile strain induced in HfO2 films by realistic substrates such as La1−xSrxMnO3 (x ≈ 0.2 ∼ 0.4) induces a transformation of the film from the paraelectric P21/c phase to the antiferroelectric Pbcn one. Subsequently, during the wake-up process, the Pbcn phase can transition into the ferroelectric phase through a low-energy barrier. This study offers insights into the depolarization mechanisms in HfO2-based ferroelectrics and presents strategies for optimizing interfacial properties and tuning phase structures, thereby providing valuable theoretical guidance for enhancing phase stability in hafnium-based ferroelectric thin films.

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