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Analysis of Josephson junction barrier variation: A combined electron microscopy, breakdown, and Monte Carlo approach

Oscar W. Kennedy*, Kevin G. Crawford, Kowsar Shahbazi, and Connor D. Shelly†

  • Oxford Quantum Circuits, Thames Valley Science Park, Shinfield, Reading RG2 9LH, United Kingdom

  • *Contact author: okennedy@oqc.tech
  • †Contact author: cshelly@oqc.tech
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Phys. Rev. Materials 9, 084803 – Published 28 August, 2025

DOI: https://doi.org/10.1103/5tb4-pslg

Abstract

Josephson junctions manufactured to tight tolerances are necessary components for superconducting quantum computing. Developing precise manufacturing techniques for Josephson junctions requires an understanding of their make-up and robust feedback metrics against which to optimize. Here, we consider complementary techniques and assess what conclusions they allow us to draw about the barriers in junctions. Monte Carlo simulations of barriers show that standard deviations of 15–20% of the total barrier thickness are compatible with our experimental data. Electrical breakdown allows us to probe the weakest points in barriers. Narrowing the distribution of this breakdown provides a promising feedback mechanism for barrier optimisation. Grouping junctions by breakdown voltage allows us to identify sub-ensembles of junctions with different median resistance. Transmission electron microscopy can be used to find average barrier thickness, although we highlight challenges in forming robust conclusions on the distribution of thicknesses in a barrier from these experiments.

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Phys. Rev. Materials 9, 084803– Published 28 August, 2025
  • Received 28 February 2025
  • Revised 14 July 2025
  • Accepted 11 August 2025
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