Reuse & Permissions

It is not necessary to obtain permission to reuse this article or its components as it is available under the terms of the Creative Commons Attribution 4.0 International license. This license permits unrestricted use, distribution, and reproduction in any medium, provided attribution to the author(s) and the published article's title, journal citation, and DOI are maintained. Please note that some figures may have been included with permission from other third parties. It is your responsibility to obtain the proper permission from the rights holder directly for these figures.

Export citation

Export citation

Choose format for download:

Download Citation
  • Open Access

Effect of W in Cu-Zr-W thin films: Molecular dynamics simulations and experimental verification

Hassan Ataalite*, Jiri Houska, Deepika Thakur, Michaela Cervena, and Petr Zeman

  • Department of Physics and NTIS, European Centre of Excellence, University of West Bohemia in Pilsen, Univerzitni 8, 301 00 Pilsen, Czech Republic

  • *Contact author: hataali@ntis.zcu.cz

Phys. Rev. Materials 10, 043402 – Published 8 April, 2026

DOI: https://doi.org/10.1103/53st-7q5j

Abstract

We investigate the effects of W incorporation into Cu-Zr thin film metallic glasses using molecular dynamics (MD) simulations combined with magnetron sputtering. All studies are carried out in the whole range of W concentrations (0 to 100 at.%) and the MD studies also in a wide range of incident energies (1 to 500 eV) and deposition angles (0 to 60∘). Calculated x-ray diffractograms, packing factor, short-range order (bonding fractions and coordination numbers), medium-range order (network ring and common neighbor statistics), and stress are correlated with measured x-ray diffractograms and technologically important properties (hardness, hardness/Young's modulus ratio, and elastic recovery). The simulations explain the experimental results at the atomic level and provide a lot of information that is not available experimentally. Special attention is paid to nonmonotonic dependencies on the elemental composition and incident energy. Collectively, the results explain the role of W in modifying the structure and improving the mechanical properties of Cu-Zr metallic glasses, predict optimum compositions which maximize some of these properties, and contribute to the development of advanced materials for various applications.

View figure in article

Physics Subject Headings (PhySH)

Article Text

Supplemental Material

References (59)

  1. W. K. Klement, R. H. Willens, and P. Duwez, Non-crystalline structure in solidified gold-silicon alloys, Nature (London) 187, 869 (1960).
  2. B. Nair and B. G. Priyadarshini, Process, structure, property and applications of metallic glasses, AIMS Mater. Sci. 3, 1022 (2016).
  3. H. Shi, Y. Xu, G. Liang, J. Zhan, and J. Chen, and X. Guo, Enhancing mechanical properties and corrosion resistance of Zr-based bulk metallic glasses by Ta addition, J. Non-Cryst. Solids 650, 123370 (2025).
  4. W. H. Wang, C. Dong, and C. H. Shek, Bulk metallic glasses, Mater. Sci. Eng. R 44, 45 (2004).
  5. M. Ashby and A. Greer, Metallic glasses as structural materials, Scr. Mater. 54, 321 (2006).
  6. D. Jang and J. R. Greer, Transition from a strong-yet-brittle to a stronger-and-ductile state by size reduction of metallic glasses, Nat. Mater. 9, 215 (2010).
  7. K. Kosiba and S. Pauly, Inductive flash-annealing of bulk metallic glasses, Sci. Rep. 7, 2151 (2017).
  8. P. Zeman, M. Zítek, Zuzjaková, and R. Čerstvý, Amorphous Zr-Cu thin-film alloys with metallic glass behavior, J. Alloy. Compd. 696, 1298 (2017).
  9. J. Houska and P. Zeman, Role of Al in Cu-Zr-Al thin film metallic glasses: Molecular dynamics and experimental study, Comput. Mater. Sci. 222, 112104 (2023).
  10. B. F. Lu, L. T. Kong, Z. Jiang, Y. Y. Huang, J. F. Li, and Y. H. Zhou, Roles of alloying additions on local structure and glass-forming ability of Cu-Zr metallic glasses, J. Mater. Sci. 49, 496 (2014).
  11. W. Zhou, J. Hou, and W. Weng, Microstructure, thermal stability and mechanical properties of Zr–Cu–Al–Sn bulk metallic glass, J. Non-Cryst. Solids 429, 208 (2015).
  12. Y. Q. Cheng and E. Ma, Atomic-level structure and structure-property relationship in metallic glasses, Prog. Mater Sci. 56, 379 (2011).
  13. A. Hirata, L. J. Kang, T. Fujita, B. Klumov, K. Matsue, M. Kotani, A. R. Yavari, and M. W. Chen, Geometric frustration of icosahedron in metallic glasses, Science 341, 376 (2013).
  14. P. Ganesh and M. Widom, Ab initio simulations of geometrical frustration in supercooled liquid Fe and Fe-based metallic glass, Phys. Rev. B 77, 014205 (2008).
  15. Z. D. Sha, Y. P. Feng, and Y. Li, Statistical composition-structure-property correlation and glass-forming ability based on the full icosahedra in Cu–Zr metallic glasses, Appl. Phys. Lett. 96, 061903 (2010).
  16. W. Lu, J. C. Tseng, A. Feng, and J. Shen, Structural origin of the enhancement in glass-forming ability of binary Ni-Nb metallic glasses, J. Non-Cryst. Solids 564, 120834 (2021).
  17. N. Mattern, P. Jóvári, I. Kaban, S. Gruner, A. Elsner, V. Kokotin, H. Franz, B. Beuneu, and J. Eckert, Short-range order of Cu-Zr metallic glasses, J. Alloy. Compd. 485, 163 (2009).
  18. G. J. Yang, B. Xu, L. T. Kong, J. F. Li, and S. Zhao, Size effects in Cu50Zr50 metallic glass films revealed by molecular dynamics simulations, J. Alloy. Compd. 688, 88 (2016).
  19. N. C. Cooper, M. S. Fagan, C. M. Goringe, N. A. Marks, and D. R. McKenzie, Surface structure and sputtering in amorphous carbon thin films: A tight-binding study of film deposition, J. Phys.: Condens. Matter 14, 723 (2002).
  20. H. Hensel and H. M. Urbassek, Simulation of the influence of energetic atoms on Si homoepitaxial growth, Phys. Rev. B 58, 2050 (1998).
  21. Z. Yan, R. Liu, B. Liu, Y. Shao, and M. Liu, Molecular dynamics simulation studies of properties, preparation, and performance of silicon carbide materials: A review, Energies 16, 1176 (2023).
  22. J. Houska, J. Rezek, and R. Cerstvy, Dependence of the ZrO2 growth on the crystal orientation: Growth simulations and magnetron sputtering, Appl. Surf. Sci. 572, 151422 (2022).
  23. N. Baguer, V. Georgieva, L. Calderin, I. T. Todorov, S. Van Gils, and A. Bogaerts, Study of the nucleation and growth of TiO2 and ZnO thin films by means of molecular dynamics simulations, J. Cryst. Growth 311, 4034 (2009).
  24. M. Kubo, Y. Oumi, R. Miura, A. Fahmi, A. Stirling, A. Miyamoto, M. Kawasaki, M. Yoshimoto, and H. Koinuma, Layer-by-layer homoepitaxial growth process of MgO(001) as investigated by molecular dynamics, density functional theory, and computer graphics, J. Chem. Phys. 107, 4416 (1997).
  25. K. Hantova and J. Houska, Molecular dynamics study of the growth of ZnOx films, J. Appl. Phys. 132, 185304 (2022).
  26. M. Kubo, Y. Oumi, H. Takaba, A. Chatterjee, A. Miyamoto, M. Kawasaki, M. Yoshimoto, and H. Koinuma, Homoepitaxial growth mechanism of ZnO(0001): Molecular-dynamics simulations, Phys. Rev. B 61, 16187 (2000).
  27. L. Xie, P. Brault, A. L. Thomann, and L. Bedra, Molecular dynamic simulation of binary ZrxCu100−x metallic glass thin film growth, Appl. Surf. Sci. 274, 164 (2013).
  28. J. Houska, M. Zhadko, R. Cerstvy, D. Thakur, and P. Zeman, Role of Zr in Cu-rich singlephase and nanocomposite Cu-Zr: Molecular dynamics and experimental study, Comput. Mater. Sci. 247, 113548 (2025).
  29. M. H. Abbasi, R. Tavakoli, and S. G. Shabestari, A novel criterion for predicting the glass-forming ability in Zr–Cu–Al ternary alloys: A molecular dynamics study, Intermetallics 164, 108126 (2024).
  30. H. Zang, G. Du, F. Yuan, X. Wang, T. Huang, and X. Song, Optimization simulation for TiZrV/Pd deposition and performance evaluation: Molecular dynamics, Surf. Interfaces 71, 106834 (2025).
  31. D. Boivin, A. Jagodar, P. Brault, T. Vaubois, E. Menou, B. Aspe, A. Caillard, P. Andreazza, M. Cavarroc-Weimer, and A. -L. Thomann, Phase formation prediction in magnetron sputtered Cu(Ti)Zn thin films: Numerical vs experimental approaches, J. Appl. Phys. 137, 145301 (2025).
  32. D. Chocyk and T. Zientarski, Molecular dynamics simulation of Ni thin films on Cu and Au under nanoindentation, Vacuum 147, 24 (2018).
  33. S. J. Plimpton, Fast parallel algorithms for short-range molecular dynamics, J. Comput. Phys. 117, 1 (1995).
  34. A. Stukowski, Visualization and analysis of atomistic simulation data with OVITO–the Open Visualization Tool, Modell. Simul. Mater. Sci. Eng. 18, 015012 (2009).
  35. M. S. Daw and M. I. Baskes, Embedded-atom method: Derivation and application to impurities, surfaces, and other defects in metals, Phys. Rev. B 29, 6443 (1984).
  36. X. W. Zhou, R. A. Johnson, and H. N. G. Wadley, Misfit-energy-increasing dislocations in vapor-deposited CoFe/NiFe multilayers, Phys. Rev. B 69, 144113 (2004).
  37. P. Gupta, K. C. Katakam, G. Katakareddi, and N. Yedla, Crack and its interaction with defects in Al coated with Cu50Zr50 metallic glass thin film: An MD simulation study, J. Mol. Model. 26, 82 (2020).
  38. W. Wei, L. Chen, H. R. Gong, and J. L. Fan, Strain-stress relationship and dislocation evolution of W-Cu bilayers from a constructed n-body W-Cu potential, J. Phys.: Condens. Matter 31, 305002 (2019).
  39. K. Wang, G. Yao, M. Lv, Z. Wang, Y. Huang, and W. Xi, The nucleation and growth mechanism of solid-state amorphization and diffusion behavior at the W–Cu interface, Composites, Part B 279, 111452 (2024).
  40. S. Chen, Z. H. Aitken, S. Pattamatta, Z. Wu, Z. G. Yu, D. J. Srolovitz, P. K. Liaw, and Y. W. Zhang, Crack tip dislocation activity in refractory high-entropy alloys, Int. J. Mech. Sci. 262, 108753 (2024).
  41. See Supplemental Material at http://link.aps.org/supplemental/10.1103/53st-7q5j for the reliability of the EAM potential and for additional figures, which also includes Refs. [42, 43, 44].
  42. L. P. Zhou, M. P. Wang, K. Peng, J. Zhu, Z. Fu, and Z. Li, Structure characteristic and its evolution of Cu-W films prepared by dual-target magnetron sputtering deposition, T. Nonferr. Metal. Soc. 22, 2700 (2012).
  43. J. Goldak, L. T. Lloyd, and C. S. Barrett, Lattice parameters, thermal expansions, and Grüneisen coefficients of Zirconium, 4.2 to 1130 K, Phys. Rev. 144, 478 (1966).
  44. C. Kittel, Introduction to Solid State Physics, 8th ed. (Wiley, Hoboken, NJ, 2005).
  45. J. Houska, P. Machanova, M. Zitek, and P. Zeman, Molecular dynamics and experimental study of the growth, structure and properties of Zr–Cu films, J. Alloy. Compd. 828, 154433 (2020).
  46. JCPDS-ICDD, PDF-4+Database, International Centre for Diffraction Data, Newton Square, PA (2015), https://www.icdd.com.
  47. A. F. Voter and J. D. Doll, Transition state theory description of surface self-diffusion: Comparison with classical trajectory results, J. Chem. Phys. 80, 5832 (1984).
  48. S. M. Oh, K. Kyuno, S. J. Koh, and G. Ehrlich, Atomic jumps in surface self-diffusion: W on W(110), Phys. Rev. B 66, 233406 (2002).
  49. D. S. Franzblau, Computation of ring statistics for network models of solids, Phys. Rev. B 44, 4925 (1991).
  50. D. Faken and H. Jónsson, Systematic analysis of local atomic structure combined with 3D computer graphics, Comput. Mater. Sci. 2, 279 (1994).
  51. Z. H. Hong, S. F. Hwang, and T. H. Fang, Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation, Comput. Mater. Sci. 48, 520 (2010).
  52. X. Zhou, X. Yu, D. Jacobson, and G. B. Thompson, A molecular dynamics study on stress generation during thin film growth, Appl. Surf. Sci. 469, 537 (2019).
  53. M. Wen, Q. N. Meng, W. X. Yu, W. T. Zheng, S. X. Mao, and M. J. Hua, Growth, stress and hardness of reactively sputtered tungsten nitride thin films, Surf. Coat. Technol. 205, 1953 (2010).
  54. M. M. M. Bilek and D. R. McKenzie, A comprehensive model of stress generation and relief processes in thin films deposited with energetic ions, Surf. Coat. Technol. 200, 4345 (2006).
  55. C. A. Davis, A simple model for the formation of compressive stress in thin films by ion bombardment, Thin Solid Films 226, 30 (1993).
  56. J. Robertson, Deposition mechanisms for promoting sp3 bonding in diamond-like carbon, Diamond Relat. Mater. 2, 984 (1993).
  57. S. Kumar, S. K. Gahlaut, and J. P. Singh, Sculptured thin films: Overcoming the limitations of surface-enhanced Raman scattering substrates, Appl. Surf. Sci. Adv. 12, 100322 (2022).
  58. G. Abadias, F. Anğay, R. Mareus, and C. Mastail, Texture and stress evolution in HfN films sputter-deposited at oblique angles, Coatings 9, 712 (2019).
  59. H. Ataalite, J. Houska, D. Thakur, M. Cervena, and P. Zeman, Dataset for publication Effect of W in Cu-Zr-W thin films: Molecular dynamics simulations and experimental verification, Zenodo (2026), 10.5281/zenodo.18456649.

Outline

Information

Sign In to Your Journals Account

Filter

Filter

Article Lookup

Enter a citation