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Physical Review B

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Jpn. J. Appl. Phys. (1)

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Origins of intrinsic stress in disordered carbon materials: A first-principles study

Yusuke Ando ^1,*, Hu Li ^2,3,†, Jianping Zhao ², Masaaki Matsukuma ³, Kenji Ishikawa ⁴, and Peter L. G. Ventzek ²

¹Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
²Concept and Feasibility Laboratory, Tokyo Electron America, Inc., Austin, Texas 78744, USA
³Simulation Technology Development Department, Tokyo Electron Technology Solutions Ltd., Nirasaki, Yamanashi 407-0192, Japan
⁴Center for Low-temperature Plasma Sciences, Nagoya University, Nagoya 464-8603, Japan

^*Contact author: ando.yusuke.a9@s.mail.nagoya-u.ac.jp
^†Contact author: hu.li@tel.com

Recent progress in atomic-scale controlled plasma processing

Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Airah P Osonio, Tran Trung Nguyen, Takayoshi Tsutsumi, Lan Li, Kazunori Shinoda, Mi-Young Song, Yong Sup Choi, Igor Kaganovich, and Yevgeny Raitses

Jpn. J. Appl. Phys. 65 120801 (2026)

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