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    Suppression of phonon transport due to ionic-to-covalent bonding transition in N-doped β−Ga2O3

    Jing Wu1, Ming Li1, Luyao Chen1, Haobo Yang1, Xin Qian1,*, Ronggui Yang2,†, and Te-Huan Liu1,‡

    • *Contact author: xinqian21@hust.edu.cn
    • †Contact author: ronggui@pku.edu.cn
    • ‡Contact author: thliu@hust.edu.cn

    Phys. Rev. B 112, 195205 – Published 18 November, 2025

    DOI: https://doi.org/10.1103/zsg8-x96w

    Abstract

    N doping has emerged as a promising approach to achieving p-type conductivity in β−Ga2O3, a leading ultrawide band gap semiconductor for high-power electronics. However, its impact on thermal transport remains insufficiently understood. In this study, we systematically investigate the effect of N substitution at three crystallographically distinct O sites, denoted as OI, OII, and OIII, in modifying phonon transport behaviors in β−Ga2O3. The first-principles calculations combined with atomistic Green's function and Boltzmann transport theory reveal that N doping induces a local ionic-to-covalent bonding transition, characterized by enhanced orbital hybridization, reduced Bader charge transfer, and asymmetric electron delocalization. This transition perturbs local interatomic force constants and enhances lattice anharmonicity, with its intensity strongly dependent on the specific doping site. Moreover, substitution at the OII site, located within a distorted Ga4O tetrahedron, exhibits the most pronounced bonding transition, resulting in stronger phonon localization and enhanced phonon-defect scattering <10 THz. Consequently, the thermal conductivity is significantly reduced, particularly along the b axis, with suppressions of up to 40% at a doping concentration of 1×1020cm−3, relevant for ohmic contacts in transistors. In contrast, doping at the OI site yields minimal disruption to bonding and heat conduction. These findings indicate the importance of doping-site selectivity in modulating phonon transport via local bonding effects and providing insights for thermal management in β−Ga2O3-based devices.

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