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    Understanding of polarization switching of ferroelectric HfO2 in the multidomain structure

    Ran Xiong1, Xinpeng Mu1, Yao Wu1, Jie Jiang1, Binjian Zeng1, Lizhong Sun1, Min Liao1,*, Yichun Zhou1,2,†, and Qiong Yang1,‡

    • 1Hunan Provincial Key Laboratory of Thin Film Materials and Devices, School of Materials Science and Engineering, Xiangtan University, Xiangtan, Hunan 411105, China
    • 2School of Advanced Materials and Nanotechnology, Xidian University, Xi’an, Shaanxi 710126, China

    • *Contact author: mliao@xtu.edu.cn
    • †Contact author: zhouyc@xtu.edu.cn
    • ‡Contact author: qyang@xtu.edu.cn

    Phys. Rev. B 113, 014315 – Published 22 January, 2026

    DOI: https://doi.org/10.1103/wz3f-pkt9

    Abstract

    The ferroelectricity origin, especially the polarization switching mechanism, is of crucial importance for the physics and application of HfO2-based ferroelectrics. However, the multiple possibilities of the polarization switching mechanism make a thorough understanding of the ferroelectricity of HfO2 still challenging. In this work, based on ab initio molecular dynamics and density functional theory calculations, polarization switching is systematically studied in 180∘ domain structures with different domain widths. It is found that the polarization switching mode with O atoms not shifting through the Hf atomic planes has a lower switching electric field in the broad domains, while that with O atoms shifting through the Hf atomic planes is dominative in the narrow domains. The triggering electric field of ferroelectric HfO2 increases with the decreasing of the domain width. These results are of crucial importance for the understanding of ferroelectricity of HfO2-based ferroelectrics with different microscopic structures and the fatigue and wake-up effects under different electric fields.

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