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    Underlying effect of interfacial dipole and electric field on ultrafast charge transfer dynamics in HfS2/MoXSe heterostructures (X = S, Se)

    Yuting Zhang1, Cong Xu1, Yanming Lin1,*, Zhenyi Jiang1, and Aijun Du2

    • 1Shaanxi Key Laboratory for Theoretical Physics Frontiers, Institute of Modern Physics, Northwest University, Xi'an 710127, People's Republic of China
    • 2School of Chemistry and Physics, Queensland University of Technology, Gardens Point Campus, Brisbane, Queensland 4000, Australia

    • *Contact author: ymlin@nwu.edu.cn

    Phys. Rev. B 113, 104303 – Published 11 March, 2026

    DOI: https://doi.org/10.1103/spm6-qy7r

    Abstract

    A fundamental understanding of ultrafast charge transfer dynamics is essential for the rational design of functional optoelectronic and photovoltaic devices. However, the underlying microscopic mechanisms of the charge transfer process at the heterojunction interface remain unclear, particularly regarding the specific role of the interfacial dipole moment and external electric field (EEF). Here, we systematically investigate the ultrafast interfacial charge transfer of HfS2/MoXSe (X=S, Se) heterostructures using ab initio nonadiabatic molecular dynamics. The results demonstrate that the HfS2/MoSe2 heterostructure exhibits strong nonadiabatic coupling, and ultrafast interlayer hole and electron transfer occurring within 116 and 136 fs, respectively. Notably, the hole transfer dynamics are significantly suppressed in the symmetry-broken HfS2/MoSSe heterostructure, which is primarily attributed to the interfacial dipole substantially modifying both the charge distribution and interlayer coupling strength. Furthermore, within the HfS2/MoSe2 system, we elucidated the asymmetric modulation mechanism of EEFs on interlayer charge transfer dynamics: a negative EEF significantly slows down charge transfer, while a positive EEF accelerates electron transfer but suppresses hole transfer. The elucidation of this specific mechanism provides important theoretical insights for developing high-performance optoelectronic devices based on two-dimensional transition metal dichalcogenide heterostructures.

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