Ab initio study of carrier mobility in
Phys. Rev. B 113, 115204 – Published 11 March, 2026
DOI: https://doi.org/10.1103/pj8c-qwmc
Abstract
is an emerging high-performance layered semiconductor with excellent stability. While experimental studies have explored carrier transport across various doping levels for both -type and -type conduction, a comprehensive theoretical understanding remains incomplete. In this work, we present parameter-free first-principles calculations of the electron and hole mobilities in , based on iterative solution of the Boltzmann transport equation that includes electron-phonon scattering and ionized impurity scattering on an equal footing. Intriguingly, we find that exhibits high electron mobilities in both the in-plane and out-of-plane directions, whereas the hole mobilities are only significant in the in-plane direction, displaying a unique three-dimensional electron transport and two-dimensional hole transport behavior. At 300 K, the calculated intrinsic electron and hole mobilities along the in-plane direction are 447 and 29 , respectively, which are primarily affected by Fröhlich electron-phonon interactions. Due to its large static dielectric permittivity, exhibits exceptionally high low-temperature electron mobilities above , and its electron mobilities above 50 K are robust against ionized impurity scattering over a wide range of impurity concentrations. By incorporating the Hall effect into our analysis, we predict an in-plane electron Hall mobility of 517 at 300 K, in excellent agreement with experimental data. These results provide valuable insights into the carrier transport mechanisms in , and offer predictive benchmarks for future theoretical and experimental investigations.