- Open Access
Hole trapping facilitates the formation of Frenkel pairs in crystalline and amorphous films
Phys. Rev. B 112, 205203 – Published 7 November, 2025
DOI: https://doi.org/10.1103/jmq5-9yy9
Abstract
Holes are injected from electrodes or produced by irradiation in many applications of crystalline and amorphous . They are known to trap in polaron states in both phases. We investigate, using density functional theory, how hole trapping in can lead to creation of Frenkel pairs (FPs) of oxygen vacancies in the charge state, , and interstitial oxygen atoms. The calculations reveal that hole bipolarons lead to the formation of O–O dimers, distorting adjacent Ga–O bonds and resulting in a significant reduction of the barriers for the nearest-neighbor FP formation with respect to pristine structures. In amorphous the barriers are on average 2.05 eV, much lower than in the crystalline phase, where they are 3.47 to 4.80 eV. Furthermore, in the amorphous phase, the migration barriers for oxygen vacancies in the charge state, , are reduced compared to those in the crystalline phase, indicating that can drift away under the influence of electric fields, creating stable defects. These results show that hole trapping in can facilitate the formation of FPs, particularly in amorphous structures. They can be useful in understanding the mechanisms of degradation in based devices under negative bias and illumination stress.
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References (71)
- S. J. Pearton IV, J. Yang, P. H. Cary IV, F. Ren, J. Kim, M. J. Tadjer, and M. A. Mastro, A review of materials, processing, and devices, Appl. Phys. Rev. 5, 011301 (2018).
- Y. Qin, S. Long, Q. He, H. Dong, G. Jian, Y. Zhang, X. Hou, P. Tan, Z. Zhang, Y. Lu et al., Amorphous gallium oxide-based gate-tunable high-performance thin film phototransistor for solar-blind imaging, Adv. Electron. Mater. 5, 1900389 (2019).
- S. Moon, D. Lee, J. Park, and J. Kim, 2D amorphous gate dielectric for field-effect transistors, ACS Appl. Mater. Interfaces 15, 37687 (2023).
- M. Higashiwaki, K. Sasaki, T. Kamimura, M. Hoi Wong, D. Krishnamurthy, A. Kuramata, T. Masui, and S. Yamakoshi, Depletion-mode metal-oxide-semiconductor field-effect transistors on (010) substrates and temperature dependence of their device characteristics, Appl. Phys. Lett. 103, 123511 (2013).
- M. Higashiwaki, K. Sasaki, A. Kuramata, T. Masui, and S. Yamakoshi, Development of gallium oxide power devices, Phys. Status Solidi A 211, 21 (2014).
- M. Higashiwaki, K. Sasaki, A. Kuramata, T. Masui, and S. Yamakoshi, Gallium Oxide () metal-semiconductor field-effect transistors on single-crystal (010) substrates, Appl. Phys. Lett. 100, 013504 (2012).
- M. Liu, M. Hua, X. Tian, Z. Wang, H. Gao, W. Wang, Y. Chen, C. Zhang, S. Zhao, Q. Feng et al., Effect of gamma irradiation on vertical Schottky barrier diode, Appl. Phys. Lett. 123, 212103 (2023).
- K. Sasaki, M. Higashiwaki, A. Kuramata, T. Masui, and S. Yamakoshi, Schottky barrier diodes fabricated by using single-crystal (010) substrates, IEEE Electron Device Lett. 34, 493 (2013).
- J. Zhang, P. Dong, K. Dang, Y. Zhang, Q. Yan, H. Xiang, J. Su, Z. Liu, M. Si, J. Gao et al., Ultra-wide bandgap semiconductor power diodes, Nat. Commun. 13, 3900 (2022).
- A. M. Armstrong, M. H. Crawford, A. Jayawardena, A. Ahyi, and S. Dhar, Role of self-trapped holes in the photoconductive gain of -gallium oxide Schottky diodes, J. Appl. Phys. 119, 103102 (2016).
- Y. Qin, L.-H. Li, Z. Yu, F. Wu, D. Dong, W. Guo, Z. Zhang, J.-H. Yuan, K.-H. Xue, X. Miao et al., Ultra-high performance amorphous photodetector arrays for solar-blind imaging, Adv. Sci. 8, 2101106 (2021).
- S. Xiao, Y. Deng, Z. Chen, Y. Wang, J. Yu, W. Tang, and Z. Wu, Flexible and highly stable solar-blind photodetector based on room-temperature synthesis of amorphous film, J. Phys. D 53, 484004 (2020).
- C. Zhou, K. Liu, X. Chen, J. Feng, J. Yang, Z. Zhang, L. Liu, Y. Xia, and D. Shen, Performance improvement of amorphous ultraviolet photodetector by annealing under oxygen atmosphere, J. Alloys Compd. 840, 155585 (2020).
- D. Guo, Z. Wu, Y. An, P. Li, P. Wang, X. Chu, X. Guo, Y. Zhi, M. Lei, L. Li et al., Unipolar resistive switching behavior of amorphous gallium oxide thin films for nonvolatile memory applications, Appl. Phys. Lett. 106, 042105 (2015).
- K.-J. Gan, P.-T. Liu, T.-C. Chien, D.-B. Ruan, and S. M. Sze, Highly durable and flexible gallium-based oxide conductive-bridging random access memory, Sci. Rep. 9, 14141 (2019).
- Y. Aoki, C. Wiemann, V. Feyer, H.-S. Kim, C. M. Schneider, H. Ill-Yoo, and M. Martin, Bulk mixed ion electron conduction in amorphous gallium oxide causes memristive behaviour, Nat. Commun. 5, 3473 (2014).
- H. Liang, S. Cui, R. Su, P. Guan, Y. He, L. Yang, L. Chen, Y. Zhang, Z. Mei, and X. Du, Flexible x-ray detectors based on amorphous thin films, ACS Photon. 6, 351 (2019).
- H. Shao, J. Zou, H. Liang, R. Zhu, Y. Zhang, X. Zhan, T. Zhu, J. Zhang, Y. Li, G. Zhang et al., Amorphous semiconductor: A new solution for robust x-ray dosimeters, Adv. Funct. Mater. 35, 2421730 (2025).
- M. Chen, Z. Zhang, R. Zhan, J. She, S. Deng, N. Xu, and J. Chen, Fast-response x-ray detector based on nanocrystalline thin film prepared at room temperature, Appl. Surf. Sci. 554, 149619 (2021).
- Z. Yang, J. Wu, P. Li, Y. Chen, Y. Yan, B. Zhu, C. S. Hwang, W. Mi, J. Zhao, K. Zhang et al., Resistive random access memory based on gallium oxide thin films for self-powered pressure sensor systems, Ceram. Int. 46, 21141 (2020).
- Z. Liu, S. Zhang, M. Zhang, J. Fang, L. Du, J. Zhang, C. Xu, Y. Guo, and W. Tang, Pressure sensing of thin film, Smart Mater. Struct. 32, 03LT01 (2023).
- M. J. Tadjer, J. L. Lyons, N. Nepal, J. A. Freitas, A. D. Koehler, and G. M. Foster, Review—theory and characterization of doping and defects in , ECS J. Solid State Sci. Technol. 8, Q3187 (2019).
- S.-H. Han, A. Mauze, E. Ahmadi, T. Mates, Y. Oshima, and J. S. Speck, -type dopants in (001) grown on (001) substrates by plasma-assisted molecular beam epitaxy, Semicond. Sci. Technol. 33, 045001 (2018).
- S. Lany, Defect phase diagram for doping of , APL Mater. 6, 046103 (2018).
- A. T. Neal, S. Mou, S. Rafique, H. Zhao, E. Ahmadi, J. S. Speck, K. T. Stevens, J. D. Blevins, D. B. Thomson, N. Moser et al., Donors and deep acceptors in , Appl. Phys. Lett. 113, 062101 (2018).
- T. Gake, Y. Kumagai, and F. Oba, First-principles study of self-trapped holes and acceptor impurities in polymorphs, Phys. Rev. Mater. 3, 044603 (2019).
- P. Deák, Q. D. Ho, F. Seemann, B. Aradi, M. Lorke, and T. Frauenheim, Choosing the correct hybrid for defect calculations: A case study on intrinsic carrier trapping in , Phys. Rev. B 95, 075208 (2017).
- B. E. Kananen, N. C. Giles, L. E. Halliburton, G. Foundos, K. Chang, and K. Stevens, Self-trapped holes in crystals, J. Appl. Phys. 122, 215703 (2017).
- C. Kaewmeechai, J. Strand, and A. Shluger, Electronic structure and properties of trapped holes in crystalline and amorphous , Phys. Rev. B 111, 035203 (2025).
- M. S. Akbar, C. Choi, S. Rhee, S. Krishnan, C. Kang, M. Zhang, T. Lee, I. Ok, F. Zhu, H.-S. Kim et al., A novel approach in separating the roles of electrons and holes in causing degradation in Hf-based MOSFET devices by using stress-anneal technique, IEEE Electron Device Lett. 28, 132 (2007).
- D. DiMaria and J. Stathis, Anode hole injection, defect generation, and breakdown in ultrathin silicon dioxide films, J. Appl. Phys. 89, 5015 (2001).
- D. L. Griscom, A minireview of the natures of radiation-induced point defects in pure and doped silica glasses and their visible/near-IR absorption bands, with emphasis on self-trapped holes and how they can be controlled, Phys. Res. Intl. 2013, 379041 (2013).
- J. Strand, M. Kaviani, and A. L. Shluger, Defect creation in amorphous facilitated by hole and electron injection, Microelectron. Eng. 178, 279 (2017).
- D. Mora-Fonz and A. L. Shluger, Modeling of intrinsic electron and hole trapping in crystalline and amorphous ZnO, Adv. Electron. Mater. 6, 1900760 (2020).
- S. Chen and L.-W. Wang, Double-hole-induced oxygen dimerization in transition metal oxides, Phys. Rev. B 89, 014109 (2014).
- O. A. Dicks and A. L. Shluger, Theoretical modeling of charge trapping in crystalline and amorphous , J. Phys.: Condens. Matter 29, 314005 (2017).
- A. de Jamblinne de Meux, G. Pourtois, J. Genoe, and P. Heremans, Effects of hole self-trapping by polarons on transport and negative bias illumination stress in amorphous-IGZO, J. Appl. Phys. 123, 161513 (2018).
- Z. Jiang, J. Wei, Y. Lv, Y. Wei, Y. Wang, J. Lu, H. Liu, Z. Feng, H. Zhou, J. Zhang et al., Nonuniform mechanism for positive and negative bias stress instability in MOSFET, IEEE Trans. Electron Devices 69, 5509 (2022).
- Y. Cai, Z. Feng, Z. Wang, X. Song, Z. Hu, X. Tian, C. Zhang, Z. Liu, Q. Feng, H. Zhou et al., Demonstration of the normally off MOSFET with high threshold voltage and high current density, Appl. Phys. Lett. 123, 193501 (2023).
- Y. Zhang, C.-H. Huang, and K. Nomura, High-mobility wide bandgap amorphous gallium oxide thin-film transistors for NMOS inverters, Appl. Phys. Rev. 11, 011418 (2024).
- X. Ouyang, S. Zhang, T. Bai, Z. Chen, Y. Deng, L. Zhou, X. Song, H. Chen, Y. Lai, X. Lu, L. Chen, L. Miao, and X. Ouyang, Performance degradation of -based x-ray detector under gamma-ray irradiation, Micromachines 16, 339 (2025).
- A. Padovani, P. La Torraca, J. Strand, L. Larcher, and A. L. Shluger, Dielectric breakdown of oxide films in electronic devices, Nat. Rev. Mater. 9, 607 (2024).
- P. La Torraca, A. Padovani, J. Strand, A. Shluger, and L. Larcher, The role of carrier injection in the breakdown mechanism of amorphous layers, IEEE Electron Device Lett. 45, 236 (2023).
- A. Padovani, P. La Torraca, J. Strand, A. Shluger, V. Milo, and L. Larcher, Towards a universal model of dielectric breakdown, in 2023 IEEE International Reliability Physics Symposium (IRPS) (IEEE, New York, 2023), pp. 1–8.
- J. Strand, P. La Torraca, A. Padovani, L. Larcher, and A. L. Shluger, Dielectric breakdown in dielectrics: Using multiscale modeling to identify the critical physical processes involved in oxide degradation, J. Appl. Phys. 131, 234501 (2022).
- D. Z. Gao, J. Strand, A.-M. El-Sayed, A. L. Shluger, A. Padovani, and L. Larcher, Role of electron and hole trapping in the degradation and breakdown of and films, in 2018 IEEE International Reliability Physics Symposium (IRPS) (IEEE, New York, 2018), pp. 5A–2.
- J. VandeVondele, M. Krack, F. Mohamed, M. Parrinello, T. Chassaing, and J. Hutter, Quickstep: Fast and accurate density functional calculations using a mixed Gaussian and plane waves approach, Comput. Phys. Commun. 167, 103 (2005).
- J. Hutter, M. Iannuzzi, F. Schiffmann, and J. VandeVondele, cp2k: Atomistic simulations of condensed matter systems, WIREs Comput. Mol. Sci. 4, 15 (2014).
- J. VandeVondele and J. Hutter, Gaussian basis sets for accurate calculations on molecular systems in gas and condensed phases, J. Chem. Phys. 127, 114105 (2007).
- S. Goedecker, M. Teter, and J. Hutter, Separable dual-space Gaussian pseudopotentials, Phys. Rev. B 54, 1703 (1996).
- J. P. Perdew, A. Ruzsinszky, G. I. Csonka, O. A. Vydrov, G. E. Scuseria, L. A. Constantin, X. Zhou, and K. Burke, Restoring the density-gradient expansion for exchange in solids and surfaces, Phys. Rev. Lett. 100, 136406 (2008).
- C. Kaewmeechai, J. Strand, and A. L. Shluger, Structure and migration mechanisms of oxygen interstitial defects in , Phys. Status Solidi B 2025, 2400652 (2025).
- M. E. Ingebrigtsen, A. Y. Kuznetsov, B. G. Svensson, G. Alfieri, A. Mihaila, U. Badstübner, A. Perron, L. Vines, and J. B. Varley, Impact of proton irradiation on conductivity and deep level defects in , Appl. Mater. 7, 022510 (2019).
- G. Henkelman, B. P. Uberuaga, and H. Jónsson, A climbing image nudged elastic band method for finding saddle points and minimum energy paths, J. Chem. Phys. 113, 9901 (2000).
- T. D. Kühne, M. Iannuzzi, M. Del Ben, V. V. Rybkin, P. Seewald, F. Stein, T. Laino, R. Z. Khaliullin, O. Schütt, F. Schiffmann et al., CP2K: An electronic structure and molecular dynamics software package-quickstep: Efficient and accurate electronic structure calculations, J. Chem. Phys. 152, 194103 (2020).
- G. Henkelman and H. Jónsson, A dimer method for finding saddle points on high dimensional potential surfaces using only first derivatives, J. Chem. Phys. 111, 7010 (1999).
- M. Guidon, J. Hutter, and J. VandeVondele, Robust periodic Hartree- Fock exchange for large-scale simulations using Gaussian basis sets, J. Chem. Theory Comput. 5, 3010 (2009).
- See Supplemental Material at http://link.aps.org/supplemental/10.1103/jmq5-9yy9 for the additional data of the formation of Frenkel pairs in amorphous and crystalline .
- Y. K. Frodason, K. Johansen, L. Vines, and J. Varley, Self-trapped hole and impurity-related broad luminescence in , J. Appl. Phys. 127, 075701 (2020).
- C. Kaewmeechai, J. Strand, and A. Shluger, Role of local structure in the optical and electronic properties of oxygen vacancies in different crystal phases of , Phys. Rev. Mater. 8, 094603 (2024).
- A. Kyrtsos, M. Matsubara, and E. Bellotti, Migration mechanisms and diffusion barriers of vacancies in , Phys. Rev. B 95, 245202 (2017).
- J. B. Varley, A. Janotti, C. Franchini, and C. G. V. de Walle, Role of self-trapping in luminescence and -type conductivity of wide-band-gap oxides, Phys. Rev. B 85, 081109(R) (2012).
- S. Falletta and A. Pasquarello, Polaron hopping through piecewise-linear functionals, Phys. Rev. B 107, 205125 (2023).
- J. W. Strand, J. Cottom, L. Larcher, and A. L. Shluger, Effect of electric field on defect generation and migration in , Phys. Rev. B 102, 014106 (2020).
- K. Sato, Y. Hayashi, N. Masaoka, T. Tohei, and A. Sakai, High-temperature operation of gallium oxide memristors up to 600 K, Sci. Rep. 13, 1261 (2023).
- A. Y. Polyakov, N. B. Smirnov, I. V. Shchemerov, E. B. Yakimov, J. Yang, F. Ren, G. Yang, J. Kim, A. Kuramata, and S. J. Pearton, Point defect induced degradation of electrical properties of by 10 MeV proton damage, Appl. Phys. Lett. 112, 032107 (2018).
- D. Z. Gao, A. M. El-Sayed, and A. L. Shluger, A mechanism for Frenkel defect creation in amorphous facilitated by electron injection, Nanotech. 27, 505207 (2016).
- A. M. El-Sayed, M. B. Watkins, V. V. Afanas' ev, and A. L. Shluger, Nature of intrinsic and extrinsic electron trapping in , Phys. Rev. B 89, 125201 (2014).
- J. Strand, O. A. Dicks, M. Kaviani, and A. L. Shluger, Hole trapping in amorphous and as a source of positive charging, Microelectron. Eng. 178, 235 (2017).
- http://www.archer2.ac.uk.
- C. Kaewmeechai, https://github.com/cywkmc21/fp_Ga2O3.