Theoretical insight into the strategy for high electron carrier concentration in with intrinsic point defects
Phys. Rev. B 113, 125203 – Published 18 March, 2026
DOI: https://doi.org/10.1103/jkj7-dnqj
Abstract
is a representative -type photocatalyst; however, a comprehensive understanding is required to enhance its electron carrier concentration . Considering intrinsic point defects, we calculate the formation energies, equilibrium Fermi-level positions, and defect/carrier concentrations of by hybrid functional calculations coupled with thermodynamic equilibrium simulations. Through formation energies calculation, we find that the (oxygen vacancy), (bismuth vacancy), and (bismuth occupies tungsten site) are the dominant intrinsic defects in . The dopability results indicate that, unlike the ineffective doping of acceptor , the donor doping can positively enhance the under O-poor conditions; however, this requires a high experimental cost of strict temperature or oxygen partial pressure . Inspiringly, the quench (from 923 to 300 K) strategy can address this issue. Using this strategy, (1) an optimal chemical potential region (OCPR) is obtained in which the is higher, without recombination centers and significant compensation. This suggests that the experimental synthesis conditions should be in OCPR; (2) the of OCPR ranges from to , which includes standard atmospheric pressure (1 atm) conditions. Interestingly, can achieve approximately in OCPR at 300 K and 1 atm, thus significantly reducing the experimental cost; and (3) the doubly positive is a desirable donor defect consistent with the experiments, thus leading to in OCPR under O-poor conditions. Therefore, to obtain high in , the following strategies should be applied simultaneously: doping, quenching, and decreasing , which is helpful for experimentally designing and synthesizing .