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    Strain-controlled sign reversal of the anomalous Hall effect in Ru/[Co/Ni]N multilayers

    Jingying Zhang1,2,*, Sigang Wang1,*, Yue Xiang3, Wenhui Xie3, Zhe Yuan4,†, Yi Liu5,6,‡, and Zongzhi Zhang2,§

    • 1The School of Physics and Astronomy, Beijing Normal University, Beijing 100875, China
    • 2Key Laboratory of Micro and Nano Photonic Structures (MOE), School of Information Science and Technology, Fudan University, Shanghai 200433, China
    • 3Engineering Research Center for Nanophotonics and Advanced Instrument, School of Physics and Electronic Science, East China Normal University, Shanghai 200062, China
    • 4State Key Laboratory of Surface Physics and Interdisciplinary Center for Theoretical Physics and Information Sciences, Fudan University, Shanghai 200433, China
    • 5Institute for Quantum Science and Technology, Shanghai University, Shanghai 200444, China
    • 6Department of Physics, Shanghai University, Shanghai 200444, China

    • *These authors contributed equally to this work.
    • †Contact author: yuanz@fudan.edu.cn
    • ‡Contact author: yiliu42@shu.edu.cn
    • §Contact author: zzzhang@fudan.edu.cn

    Phys. Rev. B 114, 084431 – Published 28 August, 2026

    DOI: https://doi.org/10.1103/gmtm-c9yx

    Abstract

    The anomalous Hall effect (AHE) is a hallmark transport phenomenon in ferromagnets arising from relativistic spin-orbit interaction. Here, we report an unexpected sign reversal of the AHE in Ru/[Co/Ni]N multilayers controlled by the stacking sequence of the Ru layer. When Ru is placed beneath, rather than atop, the Co/Ni multilayers, the anomalous Hall signal switches from positive to negative. By systematically varying the multilayer repeat number N and combining transport measurements with first-principles calculations, we show that this reversal originates from in-plane tensile strain imposed by the Ru underlayer, which reshapes the electronic structure and redistributes Berry curvature near the Fermi level. Our findings establish interfacial strain as an effective knob for tuning Berry-curvature-driven transport and suggest a pathway toward strain-controlled topological transport phenomena in magnetic multilayers.

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