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    Effects of Zr substitution on ferroelectric switching in HfO2

    Chuang Xue1,*, Tongcai Yue1,*, Yufeng Xue2,*, Qian Yin1, Sida Li3, Shuning Lv1, Tengfei Cao4, Qi Hu1,†, and Li-Min Liu1,2

    • *These authors contributed equally to this work.
    • †Contact author: huqi@buaa.edu.cn

    Phys. Rev. B 114, 264104 – Published 9 November, 2026

    DOI: https://doi.org/10.1103/brdk-5v73

    Abstract

    Hafnia-based ferroelectric films switch at room-temperature coercive fields of about 1MVcm−1, an order of magnitude below the fields predicted for homogeneous polarization reversal. The predicted switching fields can exceed the dielectric breakdown strength, although polarization reversal is experimentally observed before breakdown. In this work, we use first-principles calculations and symmetry-reduced atom mappings to compare switching in the polar Pca21 and Pmn21 structures of HfO2 and Hf0.5Zr0.5O2 (HZO). Systematic comparison of the matched pathways shows that Zr substitution lowers nearly all sampled Pca21 barriers and produces a particularly low-barrier Pmn21 180∘ reversal route. The comparison identifies a favorable Pmn21 180∘ reversal whose barrier is substantially reduced in HZO. For a field normal to the predominantly exposed {111} facets, the estimated room-temperature critical field for this route, obtained using phenomenological fourth-order Landau-Ginzburg-Devonshire temperature scaling, decreases from 2.57 MVcm−1 in HfO2 to 1.02 MVcm−1 in HZO. These results clarify how Zr substitution lowers the switching field. The identified reversal pathway helps explain the discrepancy between conventional homogeneous-switching predictions and low-field measurements.

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