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Competing regimes of carrier and impurity scattering limiting phonon heat conduction in heavily doped silicon

Raja Sen1,*,†, Juan Carlos Acosta Abanto2,*, Mélanie Brouillard3, Alessandro Ciavatta4, Séverine Gomès5, Jean-François Robillard3, Philippe Dollfus6, Lorenzo Paulatto4, Nathalie Vast7 et al.

Jérôme Saint-Martin1, Jelena Sjakste7, and Pierre-Olivier Chapuis5

  • *These authors contributed equally to this work.
  • †Contact author: rajasenphysics@gmail.com

Phys. Rev. B 114, L260303 – Published 9 November, 2026

DOI: https://doi.org/10.1103/bqc1-pd6j

Abstract

Phonon scattering by charge carriers and impurities reduces the thermal conductivity in heavily doped semiconductors, but understanding of the respective roles of these mechanisms is still lacking, as previous works arrived at apparently contradicting conclusions regarding the dominant reduction mechanism. In this work, we study the thermal conductivity of P- and B-doped silicon experimentally with the 3ω method, as well as with predictive density-functional-theory-based calculations. Our work offers a generalized picture of two distinct heat-transport reduction regimes: one due to charge-carrier scattering and another due to impurity scattering, which depend on temperature, doping concentration, and the size of the heat source. We further propose a simple concentration-dependent thermal conductivity reduction model, which demonstrates that the two reduction regimes can be clearly distinguished by different exponential stretching. Our findings reconcile the claims of previous works and can be applied to other doped semiconductors.

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