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Spin properties in droplet epitaxy grown telecom quantum dots

Marius Cizauskas1,2,*, Elisa M. Sala3, Jon Heffernan3, A. Mark Fox2, Manfred Bayer1, and Alex Greilich1,†

  • *Contact author: marius.cizauskas@tu-dortmund.de
  • †Contact author: alex.greilich@tu-dortmund.de

Phys. Rev. B 112, 165412 – Published 9 October, 2025

DOI: https://doi.org/10.1103/bm22-smcp

Abstract

We investigate the spin properties of InAs/InGaAs/InP quantum dots grown by metalorganic vapor-phase epitaxy (MOVPE) deposition using droplet epitaxy, which emits in the telecom C band. Using pump-probe Faraday ellipticity measurements, we determine electron and hole g factors of |ge|=0.93 and |gh|=0.47, with the electron g factor being nearly twice as low as typical molecular beam epitaxy Stranski-Krastanov (SK) grown samples. Most significantly, we measure a longitudinal spin relaxation time T1=3.0µs, representing an order of magnitude improvement over comparable MBE SK grown samples. Despite significant electron g-factor anisotropy, we observed that it is reduced relative to similar material composition samples grown with MBE or MOVPE SK methods. We attribute this g-factor anisotropy and spin lifetime improvements to the enhanced structural symmetry achieved via MOVPE droplet epitaxy, which mitigates the inherent structural asymmetry in strain-driven growth approaches for InAs/InP quantum dots. These results demonstrate that MOVPE droplet epitaxy-grown InAs/InGaAs/InP quantum dots exhibit favorable spin properties for potential implementation in quantum information applications.

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Corrections

9 December, 2025

Correction: A typographical error in the last sentence of the abstract has been fixed.

Article Text

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