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  • Rapid Communication

Reconstruction transitions during molecular-beam epitaxy on GaAs(111)B vicinal surfaces studied by scanning electron microscopy

Hong-Wen Ren* and Tatau Nishinaga

  • Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan

  • *Present address: Masumoto Single Quantum Dot Project, ERATO, JST, Tsukuba Research Consortium, 5-9-9 Tokodai, Tsukubashi, 300-26, Japan.

Phys. Rev. B 54, R11054(R) – Published 15 October, 1996

DOI: https://doi.org/10.1103/PhysRevB.54.R11054

Abstract

Real-time imaging of reconstruction transitions during molecular-beam epitaxy on a GaAs surface has been performed by scanning electron microscopy in the secondary-electron mode, and reconstruction-transition-associated step bunching as well as debunching behaviors were investigated. On the GaAs(111)B surface inclined 1° toward the [1¯1¯2] direction, uniform motion of atomic steps was observed at 620 °C with a growth rate of 0.1 ML/s under 19×19 reconstruction. When the growth temperature was raised to 625 °C, 1×1 high-temperature reconstruction [(1×1)HT] was found to appear from the step edges and step bunching occurred immediately. It was found that the average macrostep spacing increases in accordance with the domain sizes to a saturated value at a certain temperature. With an increase of the growth temperature, macrostep spacing was increased to cover hundreds of monatomic steps until the surface became a pure (1×1)HT reconstruction. However, as soon as the growth temperature was lowered down to 620 °C, step debunching occurred immediately in a few minutes with remarkable step motion.

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