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    First-order resonant Raman scattering under an electric field

    A. García-Cristóbal, M. Kuball, and M. Cardona

    A. Cantarero

    • Max-Planck-Institut für Festkörperforschung, Heisenbergstrasse 1, D-70569 Stuttgart, Germany

    • Departamento de Física Aplicada, Universidad de Valencia, Burjasot, E-46100 Valencia, Spain

    Phys. Rev. B 54, 11492 – Published 15 October, 1996

    DOI: https://doi.org/10.1103/PhysRevB.54.11492

    Abstract

    We derive theoretical expressions for the efficiency of one-LO-phonon Raman scattering under the presence of an electric field. Both Fröhlich and deformation potential electron-phonon interactions are considered. The calculated LO-phonon Raman intensity shows oscillations vs electric field for excitation energies above the fundamental gap E0. These results explain recently reported experimental data on electric-field-induced Raman scattering in GaAs obtained at room temperature, as well as additional data presented here which were taken at 10 K. The theoretical model allows us to assign different origins to the electro-Raman oscillations depending on the mediating electron-phonon interaction: (a) interference between the scattering amplitude for heavy-hole and split-off intraband processes in the case of Fröhlich interaction, (b) scattering amplitude involving the light-hole–heavy-hole interband transitions in the case of deformation potential interaction. For parallel polarizations along [110] or [11¯0] interference effects between the (a) and (b) scattering amplitudes are observed. © 1996 The American Physical Society.

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