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  • Letter

Oscillatory Hall effect from magnetoelectronic coupling in flexoelectronic silicon

Paul C. Lou1, Ravindra G. Bhardwaj1, Anand Katailiha1, W. P. Beyermann2, and Sandeep Kumar1,3,*

  • 1Department of Mechanical Engineering, University of California, Riverside, California 92521, USA
  • 2Department of Physics and Astronomy, University of California, Riverside, California 92521, USA
  • 3Materials Science and Engineering Program, University of California, Riverside, California 92521, USA

  • *sandeep.suk191@gmail.com

Phys. Rev. B 109, L081113 – Published 23 February, 2024

DOI: https://doi.org/10.1103/PhysRevB.109.L081113

Abstract

Magnetoelectronic coupling can be defined as cross-domain coupling between electronic and magnetic properties, where modulation in magnetic properties changes the electronic properties. In this Letter, explicit experimental evidence of magnetoelectronic coupling is presented, which is uncovered from the oscillatory Hall effect response in Hall measurement. The strain gradient in a MgO (1.8 nm)/p-Si (∼400 nm) freestanding sample leads to transfer of electrons (∼5×1018cm−3) from valence to conduction band due to flexoelectronic charge separation in the p-Si layer. The resulting flexoelectronic polarization gives rise to the temporal magnetic moment from dynamical multiferroicity. The external magnetic field changes the net temporal magnetic moment, which causes modulations in charge carrier concentration and oscillatory Hall effect. The period of oscillatory Hall response is 1.12 T, which is attributed to the magnitude of the temporal magnetic moment. The discovery of the oscillatory Hall effect adds another member to the family of Hall effects.

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