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Photoinduced dynamics of flat bands in the kagome metal CoSn

D. Puntel1, W. Bronsch2, M. Tuniz1, M. Kang3, P. M. Neves3, S. Fang3, E. Kaxiras4,5, J. G. Checkelsky3, R. Comin3 et al.

F. Parmigiani2,6 and F. Cilento2,*

  • 1Dipartimento di Fisica, Università degli Studi di Trieste, 34127 Trieste, Italy
  • 2Elettra - Sincrotrone Trieste S.C.p.A., Strada Statale 14, km 163.5, 34149 Trieste, Italy
  • 3Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA
  • 4Department of Physics, Harvard University, Cambridge, Massachusetts 02138, USA
  • 5John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA
  • 6International Faculty, University of Cologne, Albertus-Magnus-Platz, 50923 Cologne, Germany

  • *federico.cilento@elettra.eu

Phys. Rev. B 109, L081104 – Published 8 February, 2024

DOI: https://doi.org/10.1103/PhysRevB.109.L081104

Abstract

CoSn is a prototypical kagome compound showing lattice-born flat bands with suppressed bandwidth over large parts of the Brillouin zone. Here, by means of time- and angle-resolved photoelectron spectroscopy, we provide direct evidence of the response to photoexcitation of the flat bands, which underlie information about localization in real space. In particular, we detect a sudden shift and broadening of the flat bands, while after one picosecond only a broadening survives. We ascribe both these effects to an ultrafast disruption of electron localization, which renormalizes the effect of electron-electron interaction and affects the flat band dispersion. Since both variations are in the order of a few meV for an excitation fluence of a few hundreds of μJ/cm2, our measurements suggest that the flat bands are resilient to near-infrared photoexcitation in a moderate fluence reégime.

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