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Tunable spin polarization and electronic structure of bottom-up synthesized MoSi2N4 materials

Rajibul Islam1,*, Barun Ghosh2,3,*, Carmine Autieri1, Sugata Chowdhury4, Arun Bansil3, Amit Agarwal2, and Bahadur Singh5,†

  • 1International Research Centre MagTop, Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668 Warsaw, Poland
  • 2Department of Physics, Indian Institute of Technology, Kanpur 208016, India
  • 3Department of Physics, Northeastern University, Boston, Massachusetts 02115, USA
  • 4Department of Physics and Astronomy and IBM-HBCU Quantum Center, Howard University, Washington, DC 20059, USA
  • 5Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Mumbai 400005, India

  • *These authors contributed equally to this work.
  • †bahadur.singh@tifr.res.in

Phys. Rev. B 104, L201112 – Published 22 November, 2021

DOI: https://doi.org/10.1103/PhysRevB.104.L201112

Abstract

Manipulation of spin-polarized electronic states of two-dimensional (2D) materials under ambient conditions is necessary for developing new quantum devices with small physical dimensions. Here, we explore spin-dependent electronic structures of ultra-thin films of recently introduced 2D synthetic materials MSi2Z4 (M=Mo or W and Z=N or As) using first-principles modeling. Stacking of MSi2Z4 monolayers is found to generate dynamically stable bilayer and bulk materials with thickness-dependent properties. When spin-orbit coupling (SOC) is included in the computations, MSi2N4 monolayers display indirect band gaps and large spin-split states at the K and K′ symmetry points at the corners of the Brillouin zone with nearly 100% spin polarization. The spins are locked in opposite directions along an out-of-the-plane direction at K and K′, leading to spin-valley coupling effects. As expected, spin polarization is absent in the pristine bilayers due to the presence of inversion symmetry, but it can be induced via an external out-of-plane electric field much like the case of Mo(W)S2 bilayers. A transition from an indirect to a direct band gap can be driven by replacing N by As in MSi2(N,As)4 monolayers. Our study indicates that the MSi2Z4 materials can provide a viable alternative to the MoS2 class of 2D materials for valleytronics and optoelectronics applications.

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