The discovery of ferroelectric ${\mathrm{HfO}}_2$ in thin films and more recently in bulk is an important breakthrough because of its silicon compatibility and unexpectedly persistent polarization at low dimensions, but the origin of its ferroelectricity is still under debate. The stabilization of the metastable polar orthorhombic phase was often considered as the cumulative result of various extrinsic factors such as stress, grain boundary, and oxygen vacancies as well as phase transition kinetics during the annealing process. We propose a mechanism to stabilize the polar orthorhombic phase over the nonpolar monoclinic phase that is the bulk ground state. Our first-principles calculations demonstrate that the doubly positively charged oxygen vacancy, an overlooked defect but commonly presenting in binary oxides, is critical for the stabilization of the ferroelectric phase. The charge state of the oxygen vacancy serves as a degree of freedom to control the thermodynamic stability of competing phases of wide band gap oxides.

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• Ferroelectricity
• Point defects
• Oxides
• Density functional theory