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  • Letter

Valley effects on the fractions in an ultrahigh mobility SiGe/Si/SiGe two-dimensional electron system

V. T. Dolgopolov, M. Yu. Melnikov, and A. A. Shashkin

S.-H. Huang and C. W. Liu

S. V. Kravchenko

  • Institute of Solid State Physics, Chernogolovka, Moscow District 142432, Russia

  • Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 106, Taiwan and National Nano Device Laboratories, Hsinchu 300, Taiwan

  • Physics Department, Northeastern University, Boston, Massachusetts 02115, USA

Phys. Rev. B 103, L161302 – Published 14 April, 2021

DOI: https://doi.org/10.1103/PhysRevB.103.L161302

Abstract

We observe minima of the longitudinal resistance corresponding to the quantum Hall effect of composite fermions at quantum numbers p=1, 2, 3, 4, and 6 in an ultraclean strongly interacting bivalley SiGe/Si/SiGe two-dimensional electron system. The minima at p=3 disappear below a certain electron density, although the surrounding minima at p=2 and p=4 survive at significantly lower densities. Furthermore, the onset for the resistance minimum at a filling factor ν=3/5 is found to be independent of the tilt angle of the magnetic field. These surprising results indicate the intersection or merging of the quantum levels of composite fermions with different valley indices, which reveals the valley effect on fractions.

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