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  • Letter

Origin of anomalous temperature dependence of the Nernst effect in narrow-gap semiconductors

Ryota Masuki1,*, Takuya Nomoto1, and Ryotaro Arita1,2

  • 1Department of Applied Physics, The University of Tokyo,7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 2RIKEN Center for Emergent Matter Science, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan

  • *masuki-ryota774@g.ecc.u-tokyo.ac.jp

Phys. Rev. B 103, L041202 – Published 19 January, 2021

DOI: https://doi.org/10.1103/PhysRevB.103.L041202

Abstract

Based on the Boltzmann transport theory, we study the origin of the anomalous temperature dependence of the Nernst coefficient (ν) due to the phonon-drag mechanism. For narrow-gap semiconductors, we find that there are two characteristic temperatures at which a noticeable peak structure appears in ν. Contrarily, the Seebeck coefficient (S) always has only one peak. While the breakdown of the Sondheimer cancellation due to the momentum dependence of the electron relaxation time is essential for the peak in ν at low T, the contribution of the valence band to the phonon-drag current is essential for the peak at higher T. By considering this mechanism, we successfully reproduce ν and S of FeSb2, for which a gigantic phonon-drag effect is observed experimentally.

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