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    Manipulating the photoresponse of 2H-SnS2 via pressure-tuned defect-assisted recombination

    Lei Yue1,*, Guanxing Li1,*, Yifeng Jiang1, Shucong Li1, Xiaoxu Zhao2, Peng Wang1,†, Quanjun Li1,‡, and Bingbing Liu1

    • 1State Key Laboratory of High Pressure and Superhard Materials, Jilin University, Changchun 130012, China
    • 2School of Materials Science and Engineering, Peking University, Beijing 100871, China

    • *These authors contributed equally to this work
    • †Contact author: wangpengtrrs@jlu.edu.cn
    • ‡Contact author: liquanjun@jlu.edu.cn

    Phys. Rev. B 113, 235202 – Published 2 June, 2026

    DOI: https://doi.org/10.1103/46zc-7cbn

    Abstract

    Understanding how different stacking sequences in layered semiconductors respond to external stimuli is crucial for elucidating their optoelectronic behavior and for guiding the design of advanced devices. Here, we report a distinct and anomalous pressure-dependent photoresponse in 2H-SnS2 and clarify its fundamental contrast with the 4H polytype. The photocurrent of 2H-SnS2 increases by nearly 30-fold up to 2.8 GPa and then decreases at higher pressures, in contrast to the monotonically increasing photocurrent observed in 4H-SnS2 over the entire pressure range, indicating that the pressure response is strongly dependent on the stacking sequence. Concurrently, the resistance of 2H-SnS2 decreases by more than two orders of magnitude at 9.5 GPa, accompanied by an increase in the carrier density from 6.9×1014 to 1.8×1017cm−3. Combined high-pressure measurements indicate that the photocurrent evolution is dictated by the competition between pressure-induced bandgap narrowing and defect-assisted recombination. These findings provide insight into the underlying carrier dynamics in layered semiconductors and highlight the stacking structure as a key determinant of the pressure-driven evolution of their photoelectric behavior.

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