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    Optimizing electro-optic modulators for interfacing color centers in an integrated silicon carbide platform

    Ruixuan Wang, Jingwei Li, and Qing Li*

    • *Contact author: qingli2@andrew.cmu.edu

    Phys. Rev. Applied 23, 064020 – Published 9 June, 2025

    DOI: https://doi.org/10.1103/vtx9-3qw2

    Abstract

    Silicon carbide is a promising material platform for hosting various color centers that are suitable for quantum information processing. Here, we report the design and demonstration of an integrated electro-optic modulator that can directly interface silicon-vacancy centers in the 4H-silicon-carbide-on-insulator platform. Despite a relatively low electro-optic coefficient (0.22 pm/V), the optimized silicon carbide modulator is able to work in the 920-nm range with a propagation loss of less than 0.5 dB/cm, featuring a 3-dB bandwidth of around 500 MHz, an extinction ratio of 8–12 dB for an operating peak-to-peak voltage of 10 V, and a footprint of less than 0.1mm2. With such modulation performance, this approach described provides a cost-effective solution for the chip-scale implementation of the electro-optic modulation technology required for interfacing with color centers in the silicon carbide platform.

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