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    Growth and fabrication of advanced PbTe-Pb quantum devices

    Zehao Yu1,2,‡, Wenyu Song2,‡, Lining Yang2,‡, Zeyu Yan2,‡, Yuhao Wang2, Weizhao Wang2, Xinchen He2, Ruidong Li2, Jiaye Xu2 et al.

    Shuai Yang1, Zonglin Li2, Shan Zhang2, Xiao Feng2,3,4,5, Tiantian Wang3,5, Yunyi Zang3,5, Lin Li3, Runan Shang3,5, Qi-Kun Xue2,3,4,5,6, Ke He2,3,4,5,6,*, and Hao Zhang1,†

    • *Contact author: kehe@tsinghua.edu.cn
    • †Contact author: zhanghao@sustech.edu.cn
    • ‡These authors contributed equally to this work.

    Phys. Rev. Applied 26, 054018 – Published 5 November, 2026

    DOI: https://doi.org/10.1103/nvcn-m2zz

    Abstract

    We report recent progress in the growth and fabrication of advanced PbTe-Pb Majorana devices for three-terminal correlation experiments. A critical prerequisite for these devices is a continuous Pb film spanning from the PbTe nanowire to the substrate. In previous studies, PbTe nanowires were spatially separated from the substrate mask, making them unable to fulfill this requirement. To address this issue, we have developed a growth and fabrication approach. Key fabrication steps are introduced between the PbTe growth and Pb deposition. The top facet of the PbTe nanowire is covered with a Te capping layer before breaking the ultrahigh vacuum, enabling ex situ processing for subsequent steps. The mask is then removed, followed by the fabrication of shadow walls. After reloading the chip into the growth chamber, the Te protection layer is removed through thermal decomposition, and the Pb film is subsequently deposited. Notably, a pristine PbTe-Pb interface with an in situ-equivalent quality can be achieved despite the ex situ processing. Our technique facilitates the development of advanced PbTe-Pb quantum devices with complex designs, paving the way toward the realization of topological qubits.

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