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    Sub-5-nm 7-armchair hydrogened graphene nanoribbon transistors: More symmetric n- and p-type performance for homogeneous CMOS applications

    Linqiang Xu1,2,*, Shiqi Liu3,*, Qiuhui Li2, Ying Li2, Shibo Fang2, Ying Guo4, Yee Sin Ang5,†, Chen Yang2,‡, and Jing Lu2,6,7,8,9,§

    • *These authors contributed equally to this work.
    • †Contact author: yeesin_ang@sutd.edu.sg
    • ‡Contact author: yangchen96@pku.edu.cn
    • §Contact author: jinglu@pku.edu.cn

    Phys. Rev. Applied 26, 034007 – Published 2 September, 2026

    DOI: https://doi.org/10.1103/f63w-s35v

    Abstract

    Graphene nanoribbon (GNR) emerges as an exceptionally promising channel candidate due to its tunable sizable band gap (0–3 eV), ultrahigh carrier mobility (up to 4600  cm2 V−1 s−1), and excellent device performance (current on-off ratio of 107). However, the asymmetry of reported n-type and p-type GNR field-effect transistors (FETs) at ultrashort gate length (Lg) has become an obstacle to future complementary metal-oxide-semiconductor (CMOS) integration. Here, we conduct ab initio quantum transport simulations to investigate the transport properties of sub-5-nm Lg 7-armchair-edge hydrogened GNR (7 AGNRH) FETs. The on-state current, delay time, and power dissipation of the n-type and p-type 7 AGNRH FETs fulfill the International Technology Roadmap for Semiconductors targets for high-performance devices when Lg is reduced to 3 nm. Remarkably, the 7 AGNRH FETs exhibit superior n-type and p-type symmetry to the 7-9-7 AGNRH FETs due to the more symmetrical electron and hole effective masses. Compared with the monolayer MoS2 and MoTe2 counterparts, the 7 AGNRH FETs have better device performance, which could be further improved via gate engineering. Our results shed light on the immense potential of 7 AGNRH in advancing CMOS electronics beyond silicon.

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