Flux-trapping characterization for superconducting electronics using a cryogenic widefield N-V diamond microscope
Phys. Rev. Applied 25, 044073 – Published 24 April, 2026
DOI: https://doi.org/10.1103/3zcp-lsrd
Abstract
Magnetic flux trapping is a significant hurdle limiting the reliability and scalability of superconducting electronics, yet tools for imaging flux vortices remain slow or insensitive. We present a cryogenic widefield N-V diamond magnetic microscope capable of rapid, micrometer-scale imaging of flux trapping in superconducting devices. Using this technique, we measure vortex expulsion fields in thin films and patterned strips, revealing a crossover in expulsion behavior between 10- and 20- strip widths. The observed scaling agrees with theoretical models and suggests the influence of film defects on vortex expulsion dynamics. This instrument enables high-throughput magnetic characterization of superconducting materials and circuits, providing new insight for flux mitigation strategies in scalable superconducting electronics.
