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β-Ga2O3-based heterojunctions: Effects of growth orientation and alloying on electronic properties

Mohamed Abdelilah Fadla1,*, Khushabu Agrawal2, Paolo La Torraca2, Myrta Grüning1,3, Karim Cherkaoui2, and Lorenzo Stella1

  • *Contact author: m.fadla@qub.ac.uk

Phys. Rev. Applied 26, 014046 – Published 16 July, 2026

DOI: https://doi.org/10.1103/3vmk-vfcz

Abstract

We investigate the effects of alloying and growth orientation on the electronic properties of the ultrawide bandgap semiconductor β-Ga2O3 and pseudomorphic (AlxGa1−x)2O3 alloy heterojunctions. Band offsets are computed from first principles using density functional theory with the Heyd-Scuseria-Ernzerhof hybrid functional for different aluminum concentrations and four growth orientations, namely, (100)B, (010), (001)B, and (2¯01). Significant variations are found and ascribed to the strained pseudomorphic alloys. The values of the band offsets are fed into technology computer-aided design (TCAD) models of Schottky barrier diodes (SBD). I-V and C-V characteristics from the TCAD models show reasonable agreement with recent experimental measurements in the forward bias region. Discrepancies in the negative bias region are expected due to the ideality of the Schottky junctions considered in this study. Our findings underscore the critical role of growth orientation and strain in the accurate modeling of β-Ga2O3-based SBD.

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References (39)

  1. M. Higashiwaki, K. Sasaki, A. Kuramata, T. Masui, and S. Yamakoshi, Gallium oxide (Ga2O3) metal-semiconductor field-effect transistors on single-crystal β−Ga2O3 (010) substrates, Appl. Phys. Lett. 100, 013504 (2012).
  2. W. S. Hwang, A. Verma, H. Peelaers, V. Protasenko, S. Rouvimov, H. (Grace) Xing, A. Seabaugh, W. Haensch, C. V. de Walle, Z. Galazka, M. Albrecht, R. Fornari, and D. Jena, High-voltage field effect transistors with wide-bandgap β−Ga2O3 nanomembranes, Appl. Phys. Lett. 104, 203111 (2014).
  3. B. W. Krueger, C. S. Dandeneau, E. M. Nelson, S. T. Dunham, F. S. Ohuchi, M. A. Olmstead, and J. Jones, Variation of band gap and lattice parameters of β−(AlxGa1−x)2O3 powder produced by solution combustion synthesis, J. Am. Ceram. Soc. 99, 2467 (2016).
  4. J. Li, X. Chen, T. Ma, X. Cui, F.-F. Ren, S. Gu, R. Zhang, Y. Zheng, S. P. Ringer, L. Fu, H. H. Tan, C. Jagadish, and J. Ye, Identification and modulation of electronic band structures of single-phase β−(AlxGa1−x)2O3 alloys grown by laser molecular beam epitaxy, Appl. Phys. Lett. 113, 041901 (2018).
  5. H. Peelaers, J. B. Varley, J. S. Speck, and C. G. Van de Walle, Structural and electronic properties of Ga2O3−Al2O3 alloys, Appl. Phys. Lett. 112, 242101 (2018).
  6. A. Ratnaparkhe and W. R. L. Lambrecht, Quasiparticle self-consistent GW study of (Ga1−xAlx)2O3 alloys in monoclinic and corundum structures, Phys. Status Solidi B 257, 1900317 (2020).
  7. S. Mu, M. Wang, H. Peelaers, and C. G. Van De Walle, First-principles surface energies for monoclinic Ga2O3 and Al2O3 and consequences for cracking of (AlxGa1−x)2O3, APL Mater. 8, 091105 (2020).
  8. H. W. Kim, H. Ko, Y.-C. Chung, and S. B. Cho, Heterostructural phase diagram of Ga2O3‐based solid solution with Al2O3, J. Eur. Ceram. Soc. 41, 611 (2021).
  9. M. A. Fadla, M. Gruning, and L. Stella, Effective band structure and crack formation analysis in pseudomorphic epitaxial growth of (InxGa1−x)2O3 alloys: A first-principles study, ACS Omega 9, 15320 (2024).
  10. B. W. Krueger, C. S. Dandeneau, E. M. Nelson, S. T. Dunham, F. S. Ohuchi, M. A. Olmstead, and J. Jones, Variation of band gap and lattice parameters of β−(AlxGa1−x)2O3 powder produced by solution combustion synthesis, J. Am. Ceram. Soc. 99, 2467 (2016).
  11. C. Kranert, M. Jenderka, J. Lenzner, M. Lorenz, H. Von Wenckstern, R. Schmidt-Grund, and M. Grundmann, Lattice parameters and raman-active phonon modes of β−(AlxGa1−x)2O3, J. Appl. Phys. 117, 125703 (2015).
  12. X. Wang, Z. Chen, F. Zhang, K. Saito, T. Tanaka, M. Nishio, and Q. Guo, Temperature dependence ofRaman scattering in β−(AlGa)2O3 thin films, AIP Adv. 6, 015111 (2016).
  13. S. Lyu, Band offsets at the interfaces between β−Ga2O3 and Al2O3, Phys. Rev. Mater. 7, 014603 (2023).
  14. T. Wang, W. Li, C. Ni, and A. Janotti, Band gap and band offset of Ga2O3 and (AlxGa1−x)2O3 alloys, Phys. Rev. Appl. 10, 011003 (2018).
  15. Y. Hinuma, T. Gake, and F. Oba, Band alignment at surfaces and heterointerfaces of Al2O3, Ga2O3, In2O3, and related group-III oxide polymorphs: A first-principles study, Phys. Rev. Mater. 3, 084605 (2019).
  16. S. Seacat, J. L. Lyons, and H. Peelaers, Computational design of optimal heterostructures for β−Ga2O3, Phys. Rev. Mater. 8, 014601 (2024).
  17. S. Seacat, J. L. Lyons, and H. Peelaers, Orthorhombic alloys of Ga2O3 and Al2O3, Appl. Phys. Lett. 116, 232102 (2020).
  18. S. Mu, H. Peelaers, Y. Zhang, M. Wang, and C. G. Van de Walle, Orientation-dependent band offsets between (AlxGa1−x)2O3 and Ga2O3, Appl. Phys. Lett. 117, 252104 (2020).
  19. P. H. Carey IV, F. Ren, D. C. Hays, B. Gila, S. Pearton, S. Jang, and A. Kuramata, Band alignment of Al2O3 with (−201) β−Ga2O3, Vacuum 142, 52 (2017).
  20. T. Kamimura, K. Sasaki, M. Hoi Wong, D. Krishnamurthy, A. Kuramata, T. Masui, S. Yamakoshi, and M. Higashiwaki, Band alignment and electrical properties of Al2O3/β−Ga2O3 heterojunctions, Appl. Phys. Lett. 104, 192104 (2014).
  21. T.-H. Hung, K. Sasaki, A. Kuramata, D. N. Nath, P. Sung Park, C. Polchinski, and S. Rajan, Energy band line-up of atomic layer deposited Al2O3 on β−Ga2O3, Appl. Phys. Lett. 104, 162106 (2014).
  22. M. Hattori, T. Oshima, R. Wakabayashi, K. Yoshimatsu, K. Sasaki, T. Masui, A. Kuramata, S. Yamakoshi, K. Horiba, H. Kumigashira, and A. Ohtomo, Epitaxial growth and electric properties of γ−Al2O3 (110) films on β−Ga2O3 (010) substrates, Jpn. J. Appl. Phys. 55, 1202B6 (2016).
  23. G. Kresse and J. Furthmüller, Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set, Phys. Rev. B 54, 11169 (1996).
  24. G. Kresse and J. Furthmüller, Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set, Comput. Mater. Sci. 6, 15 (1996).
  25. G. Kresse and J. Hafner, Ab initio molecular dynamics for liquid metals, Phys. Rev. B 47, 558 (1993).
  26. J. Sun, A. Ruzsinszky, and J. P. Perdew, Strongly constrained and appropriately normed semilocal density functional, Phys. Rev. Lett. 115, 036402 (2015).
  27. J. Heyd, G. E. Scuseria, and M. Ernzerhof, Hybrid functionals based on a screened Coulomb potential, J. Chem. Phys. 118, 8207 (2003).
  28. A. V. Krukau, O. A. Vydrov, A. F. Izmaylov, and G. E. Scuseria, Influence of the exchange screening parameter on the performance of screened hybrid functionals, J. Chem. Phys. 125, 224106 (2006).
  29. P. E. Blöchl, Projector augmented-wave method, Phys. Rev. B 50, 17953 (1994).
  30. J. Åhman, G. Svensson, and J. Albertsson, A reinvestigation of β-gallium oxide, Acta Crystallogr. Sect., C 52, 1336 (1996).
  31. A. van de Walle, P. Tiwary, M. de Jong, D. L. Olmsted, M. Asta, A. Dick, D. Shin, Y. Wang, L.-Q. Chen, and Z.-K. Liu, Efficient stochastic generation of special quasirandom structures, Calphad 42, 13 (2013).
  32. Applied Materials, Ginestra® (2025), https://www.appliedmaterials.com/us/en/semiconductor/solutions-and-software/software-solutions/ginestra-simulation-platform.html?.
  33. See Supplemental Material at http://link.aps.org/supplemental/10.1103/3vmk-vfcz for detailed information on the modeling parameters, including the structures used for simulations in both bulk and interface calculations, a comprehensive list of parameters employed in the device simulation, and computational methodology and calculation parameters.
  34. P. P. Sundaram, F. Alema, A. Osinsky, and S. J. Koester, β−(AlxGa1−x)2O3/Ga2O3 heterostructure Schottky diodes for improved VBR2/RON, J. Vac. Sci. Technol., A 40, 043211 (2022).
  35. D. Guo, Q. Guo, Z. Chen, Z. Wu, P. Li, and W. Tang, Review of Ga2O3-based optoelectronic devices, Mater. Today Phys. 11, 100157 (2019).
  36. D. H. Mudiyanselage, D. Wang, and H. Fu, Ultrawide bandgap vertical β−(AlxGa1−x)2O3 Schottky barrier diodes on free-standing β−Ga2O3 substrates, J. Vac. Sci. Technol., A 41, 023201 (2023).
  37. M. Schubert, R. Korlacki, S. Khayam, Y. Traouli, P. Sorensen, A. Papamichail, and V. Darakchieva, Strain–stress relationships for coherent in-plane strain in heterostructures with monoclinic crystal systems: β−(AlxGa1−x)2O3 on (h0l) β−Ga2O3 as example, Phys. Rev. Appl. 24, 044075 (2025).
  38. A. Latreche, Combined thermionic emission and tunneling mechanisms for the analysis of the leakage current for Ga2O3 Schottky barrier diodes, SN Appl. Sci. 1, 188 (2019).
  39. H. Okumura, Y. Kato, T. Oshima, and T. Palacios, Demonstration of lateral field-effect transistors using Sn-doped β−(AlGa)2O3 (010), Jpn. J. Appl. Phys. 58, SBBD12 (2019).

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