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Ultrahigh interfacial thermal conductance for cooling gallium oxide electronics using cubic boron arsenide

Wenjiang Zhou1,2, Nianjie Liang1, Wei Xiao1, Zhaofei Tong3, Fei Tian3, and Bai Song1,4,5,*

  • 1Department of Energy and Resources Engineering, Peking University, Beijing 100871, China
  • 2School of Advanced Engineering, Great Bay University, Dongguan 523000, China
  • 3School of Materials Science and Engineering, Sun Yat-sen University, Guangzhou, Guangdong 510006, China
  • 4Department of Advanced Manufacturing and Robotics, Peking University, Beijing 100871, China
  • 5National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Peking University, Beijing 100871, China

  • *Contact author: songbai@pku.edu.cn

Phys. Rev. Applied 24, L031005 – Published 29 September, 2025

DOI: https://doi.org/10.1103/17tk-9xwv

Abstract

Gallium oxide (Ga2O3) has attracted significant interest for its unique potential, especially in power electronics. However, its low and anisotropic thermal conductivity poses a major challenge for heat dissipation. Here, we explore an effective cooling strategy centering on the heterogeneous integration of β-Ga2O3 devices with cubic boron arsenide (cBAs), an emerging material with an ultrahigh thermal conductivity κ of ∼1300 Wm−1K−1. Machine-learned potentials for representative β-Ga2O3/cBAs interfaces are trained, enabling accurate and efficient calculation of the interfacial thermal conductance G via nonequilibrium molecular dynamics. At 300 K, remarkable G values of 681 ± 29 MWm−2K−1 and 752 ± 32 MWm−2K−1 are predicted for Ga-As and O-B bonding across the interface, respectively, which are primarily attributed to the well-matched phonon density of states considering the similar Debye temperatures of β-Ga2O3 and cBAs. Moreover, finite-element simulations directly show a notable device temperature reduction when comparing cBAs with other substrates. The simultaneously ultrahigh κ and G highlight cBAs as an ideal substrate for Ga2O3 electronics.

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