Optimally Tensile Strained Films as Candidate High-Temperature Superconductors on Designer Substrates and SrO-Terminated
Phys. Rev. Lett. 136, 196002 – Published 12 May, 2026
DOI: https://doi.org/10.1103/p3bb-9njy
Abstract
High-temperature superconductivity in -derived films with critical temperatures () of 40–50 K has so far been realized only under substrate-induced compressive strain. Here we use first-principles calculations to predict that such films can be stably grown on designer substrates () and SrO-terminated () with improved film quality and continuously tunable epitaxial strain, offering physically realistic materials platforms to achieve enhanced superconductivity. In particular, under the optimal tensile strain of imposed by or , the films are energetically stable within a desirable thickness range, and more resilient against oxygen vacancy formation. Concomitantly, the lattice constant normal to the films is effectively reduced, and the Ni orbital is peaked near the Fermi level and hybridizes with the Ni orbital, features that closely resemble their bulk counterparts at high pressure and strongly point to superconductivity with higher . These findings establish innovative routes toward realizing enhanced superconductivity in tensile-strained films, and allow to critically assess the role of the Ni orbital in superconducting pairing.