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    Overcoming Asymmetric Carrier Injection in III-Nitride Light-Emitting Diodes through Defect Engineering

    Yuxin Yang1,2, Zhiming Shi1,2,*, Shunpeng Lv1,2, Hang Zang1, Xiaobao Ma1,2, Feng Zhang1,2, Yan Yu1,2, Peng Han1,2, Ke Jiang1,2 et al.

    Xiaolan Yan3, Su-Huai Wei3,†, Xiaojuan Sun1,2,‡, and Dabing Li1,2,§

    • *Contact author: shizm@ciomp.ac.cn
    • †Contact author: sunxj@ciomp.ac.cn
    • ‡Contact author: suhuaiwei@eitech.edu.cn
    • §Contact author: lidb@ciomp.ac.cn

    Phys. Rev. Lett. 135, 026402 – Published 8 July, 2025

    DOI: https://doi.org/10.1103/kt15-x472

    Abstract

    The rapid advancements in the semiconductor industry are often accompanied by a breakthrough in defect engineering. While defects usually hinder device performance, they can also offer new opportunities for manipulating semiconductor properties. In this Letter, we present an effective approach to solving the long-standing asymmetric injection of carriers problem in LEDs by introducing nitrogen vacancies (VN) at the GaN/AlN quantum well (QW) interface. The VN states function as “steps” as well as sources of perturbation potential to improve the electron relaxation to the bottom of the conduction band through the electron-phonon (el-ph) coupling. The electron relaxation time (τe), initially as long as 8.61 ps, was reduced to 0.15 ps, comparable to the τh (0.12 ps). Our work not only resolves a persistent bottleneck in GaN-based light sources but also offers a new perspective on utilizing defects to engineer carrier relaxation.

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