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    Antiferroelectricity in BiFeO3 Thin Films

    Menghui Xia1, Sukriti Mantri2,*, L. Bellaiche2,3, and Bin Xu1,†

    • 1Jiangsu Key Laboratory of Frontier Material Physics and Devices, Jiangsu Key Laboratory of Advanced Negative Carbon Technologies, School of Physical Science and Technology, Soochow University, Suzhou 215006, China
    • 2Smart Ferroic Materials Center, Physics Department and Institute for Nanoscience and Engineering, University of Arkansas, Fayetteville, Arkansas 72701, USA
    • 3Department of Materials Science and Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv 6997801, Israel

    • *Contact author: smantri@uark.edu
    • †Contact author: binxu19@suda.edu.cn

    Phys. Rev. Lett. 135, 206101 – Published 12 November, 2025

    DOI: https://doi.org/10.1103/fqpx-dpbn

    Abstract

    Antiferroelectric (AFE) materials are rarer than ferroelectrics (FEs). Yet they hold great potential for niche applications, mostly thanks to the electric-field induced reversible transformation between the AFE and FE states. In addition to the extrinsic method of chemical doping, intrinsically converting a FE material into AFE presents significant scientific and technological interest. Here, using a first-principles-based computational scheme, we demonstrate that thin films offer an opportunity to modify the FE ground state of the well-known room-temperature multiferroic BiFeO3 into an AFE phase by controlling the film thickness and electrostatic boundary conditions. Such transition results from a surface effect related to the delicate balance between the short-range and long-range dipole-dipole interactions, and the particular structure of the AFE phase. Simulations reveal the criteria for double hysteresis loop formation. The effect of temperature and strain on the stability of the AFE state is further discussed.

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