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Pattern Stabilization through Parameter Alternation in a Nonlinear Optical System

J. P. Sharpe, P. L. Ramazza, N. Sungar, and Karl Saunders
Phys. Rev. Lett. 96, 094101 – Published 8 March 2006

Abstract

We report the first experimental realization of pattern formation in a spatially extended nonlinear system when the system is alternated between two states, neither of which exhibits patterning. Dynamical equations modeling the system are used for both numerical simulations and a weakly nonlinear analysis of the patterned states. The simulations show excellent agreement with the experiment. The nonlinear analysis provides an explanation of the patterning under alternation and accurately predicts both the observed dependence of the patterning on the frequency of alternation and the measured spatial frequencies of the patterns.

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  • Received 22 August 2005

DOI:https://doi.org/10.1103/PhysRevLett.96.094101

©2006 American Physical Society

Authors & Affiliations

J. P. Sharpe1,*, P. L. Ramazza2, N. Sungar1, and Karl Saunders1

  • 1Department of Physics, Cal Poly State University, San Luis Obispo, California 93407, USA
  • 2Istituto Nazionale di Ottica, Largo E. Fermi 6, I50125 Florence, Italy

  • *Electronic address: jsharpe@calpoly.edu

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Issue

Vol. 96, Iss. 9 — 10 March 2006

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